Fig. 1. Schematic diagram of MCF polishing device and principle

Fig. 2. Schematic diagram of the formation of magnetic clusters in the polishing head

Fig. 3. Schematic diagram of the polished cross-section profile over time

Fig. 4. Three-dimensional and two-dimensional contours of polished spots (A3, MCF polished for 15 min)

Fig. 5. Volume removal and removal rate of polished material

Fig. 6. Surface microstructure of workpiece

Fig. 7. Evolution of surface roughness with polishing time

Fig. 8. Model of contact between polishing wheel and workpiece and microscopic morphology of magnetic clusters

Fig. 9. Spatial distribution law of MCF polishing fluid dynamic pressure $$\text{Unknown environment 'document'}$$

Fig. 10. Modeling of MCF and UMCF polished grit forces and fused silica element indentation

Fig. 11. Polishing area pressure at different times for MCF and UMCF polishing

Fig. 12. Schematic diagram of the "double-edged circle" model

Fig. 13. Mathematical model of material removal rate