Chinese Optics Letters, Volume. 7, Issue 6, 06489(2009)

MOCVD growth of AlGaInP/GaInP quantum well laser diode with asymmetric cladding structure for high power applications

Peixu Li, Ling Wang, Shuqiang Li, Wei Xia, Xin Zhang, Qingmin Tang, Zhongxiang Ren, and Xiangang Xu
Author Affiliations
  • State Key Lab of Crystal Materials, Shandong University, Ji'nan 250100, China
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    In order to improve the characteristics of the general broad-waveguide 808-nm semiconductor laser diode (LD), we design a new type quantum well LD with an asymmetric cladding structure. The structure is grown by metal organic chemical vapor deposition (MOCVD). For the devices with 100-\mum-wide stripe and 1000-\mum-long cavity under continuous-wave (CW) operation condition, the typical threshold current is 190 mA, the slope efficiency is 1.31 W/A, the wall-plug efficiency reaches 63%, and the maximum output power reaches higher than 7 W. And the internal absorption value decreases to 1.5 cm^{-1}.

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    Peixu Li, Ling Wang, Shuqiang Li, Wei Xia, Xin Zhang, Qingmin Tang, Zhongxiang Ren, Xiangang Xu. MOCVD growth of AlGaInP/GaInP quantum well laser diode with asymmetric cladding structure for high power applications[J]. Chinese Optics Letters, 2009, 7(6): 06489

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    Paper Information

    Received: Sep. 22, 2008

    Accepted: --

    Published Online: Jun. 8, 2009

    The Author Email:

    DOI:10.3788/COL20090706.0489

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