INFRARED, Volume. 44, Issue 4, 1(2023)

Study on Dry/Wet Etching Preparationof InAs/GaSb Type-II Superlattice Dual-Color

Tao WEN, Yu-nong HU1, Jing-feng LI1, Cheng-cheng ZHAO1, Guo-Wei WANG2, and LIU MingInfrared Focal Plane Devices 1
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  • 1[in Chinese]
  • 2[in Chinese]
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    InAs/GaSb type-II superlattice long-wave/long-wave dual-color infrared focal plane devices with an array size of 320×256 and a pixel pitch of 30 m were prepared by dry/wet etching process, respectively. The mesa profile,contact hole profile,voltage-current characteristics,and mid-test performance after interconnecting the readout circuit and sealing dewar were compared. The characteristics of the fabrication of dual-color InAs/GaSb type-II superlattice focal plane devices by dry/wet etching process were summarized. This study has reference significance for the study of InAs/GaSb type-II superlattice focal plane devices.

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    WEN Tao, HU Yu-nong, LI Jing-feng, ZHAO Cheng-cheng, WANG Guo-Wei, LIU MingInfrared Focal Plane Devices. Study on Dry/Wet Etching Preparationof InAs/GaSb Type-II Superlattice Dual-Color[J]. INFRARED, 2023, 44(4): 1

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    Paper Information

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    Received: Oct. 31, 2022

    Accepted: --

    Published Online: Jan. 15, 2024

    The Author Email:

    DOI:10.3969/j.issn.1672-8785.2023.04.001

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