Chinese Optics Letters, Volume. 21, Issue 1, 011401(2023)

All-solid-state far-UVC pulse laser at 222 nm wavelength for UVC disinfection

Qihui Luo1,2, Jian Ma1、*, Miao Wang1,2, Tingting Lu1、**, and Xiaolei Zhu1,2,3
Author Affiliations
  • 1Key Laboratory of Space Laser Communication and Detection Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Pilot National Laboratory for Marine Science and Technology, Qingdao 266237, China
  • show less
    Figures & Tables(10)
    Schematic diagram of the experimental setup.
    Output pulse energy of the OPO at 444 nm as a function of the pump pulse energy.
    Pulse temporal profile of the 444 nm laser.
    Intensity distribution profile of 444 nm laser beam.
    M2 factors measured for the 444 nm laser beam.
    Output laser spectrum of the OPO at 444 nm.
    Output pulse energy of SHG at 222 nm as a function of the fundamental pulse energy.
    Spectrum of the 222 nm laser.
    Pulse temporal profile of the 222 nm laser.
    Tunable output in UVC spectral range.
    Tools

    Get Citation

    Copy Citation Text

    Qihui Luo, Jian Ma, Miao Wang, Tingting Lu, Xiaolei Zhu. All-solid-state far-UVC pulse laser at 222 nm wavelength for UVC disinfection[J]. Chinese Optics Letters, 2023, 21(1): 011401

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Lasers, Optical Amplifiers, and Laser Optics

    Received: Apr. 18, 2022

    Accepted: Jul. 15, 2022

    Posted: Jul. 15, 2022

    Published Online: Sep. 26, 2022

    The Author Email: Jian Ma (majian@siom.ac.cn), Tingting Lu (tingting_lu@siom.ac.cn)

    DOI:10.3788/COL202321.011401

    Topics