Infrared and Laser Engineering, Volume. 49, Issue 9, 20200169(2020)

Research on the bandpass filter used for single-exposure multi-spectral ghost imaging system

Meixuan Li1,2, Siqi Zhang1,2, Hong Li1,2, Nan Li1,2, Yuxuan Ren3, and Jialong Tian3
Author Affiliations
  • 1Institute for Interdisciplinary Quantum Information Technology, Jilin Engineering Normal University, Changchun 130052, China
  • 2Jilin Engineering Laboratory for Quantum Information Technology, Changchun 130052, China
  • 3Faculty of Applied Sciences, Jilin Engineering Normal University, Changchun 130052, China
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    Figures & Tables(12)
    Structure of single-exposure multi-spectral intensity correlation imaging system
    Theoretical design curve of a thin film device in a single-exposure multispectral correlation imaging system
    Three-dimensional morphology of SiO2 films with different deposition rates
    Material optical constants
    Comparison chart of spectral test curve and design curve
    Residual vapor deposition of each film layer
    Comparison of residual evaporation before and after modification
    Fitting curve of Nb2O5 and SiO2 film thickness and residual evaporation
    Band pass filter transmittance test curve
    • Table 1.

      Technical parameter

      技术参数

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      Table 1.

      Technical parameter

      技术参数

      ParameterSpecification
      SubstrateBK7
      Incident angle/(°)0-30
      Spectrum range/nm350-440450-700710-800
      Transmittance<0.5%≥98%<0.5%
    • Table 2.

      Surface roughness of UV-SiO2 film at different deposition rates

      不同沉积速率UV-SiO2薄膜表面粗糙度

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      Table 2.

      Surface roughness of UV-SiO2 film at different deposition rates

      不同沉积速率UV-SiO2薄膜表面粗糙度

      Surface roughnessDeposition rates
      0.5 nm/s0.7 nm/s0.9 nm/s
      Sa/μm 0.002 20.001 20.001 7
      Sq/μm 0.002 30.001 20.002 1
      Sz/μm 0.059 00.026 30.136 3
    • Table 3.

      Deposition process parameters of Nb2O5 and UV-SiO2

      Nb2O5和UV-SiO2沉积工艺参数

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      Table 3.

      Deposition process parameters of Nb2O5 and UV-SiO2

      Nb2O5和UV-SiO2沉积工艺参数

      MaterialSubstrate temperature/℃Degree of vacuum/PaDeposition rate/(nm·s−1) Flow rate of O2/sccm
      KaufmanHPE
      SiO21801.0×10−30.750
      Nb2O51801.0×10−30.53515
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    Meixuan Li, Siqi Zhang, Hong Li, Nan Li, Yuxuan Ren, Jialong Tian. Research on the bandpass filter used for single-exposure multi-spectral ghost imaging system[J]. Infrared and Laser Engineering, 2020, 49(9): 20200169

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    Paper Information

    Category:

    Received: Jun. 7, 2020

    Accepted: --

    Published Online: Jan. 4, 2021

    The Author Email:

    DOI:10.3788/IRLA20200169

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