Infrared and Laser Engineering, Volume. 49, Issue 9, 20200169(2020)
Research on the bandpass filter used for single-exposure multi-spectral ghost imaging system
Figures & Tables(12)
Fig. 1. Structure of single-exposure multi-spectral intensity correlation imaging system
Fig. 2. Theoretical design curve of a thin film device in a single-exposure multispectral correlation imaging system
Fig. 3. Three-dimensional morphology of SiO2 films with different deposition rates
Fig. 7. Comparison of residual evaporation before and after modification
Fig. 8. Fitting curve of Nb2O5 and SiO2 film thickness and residual evaporation
Table 1.
Technical parameter
技术参数
View tableView in ArticleTable 1.
Technical parameter
技术参数
Parameter Specification Substrate BK7 Incident angle/(°) 0-30 Spectrum range/nm 350-440 450-700 710-800 Transmittance <0.5% ≥98% <0.5%
Table 2.
Surface roughness of UV-SiO2 film at different deposition rates
不同沉积速率UV-SiO2薄膜表面粗糙度
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Surface roughness of UV-SiO2 film at different deposition rates
不同沉积速率UV-SiO2薄膜表面粗糙度
Surface roughness Deposition rates 0.5 nm/s 0.7 nm/s 0.9 nm/s S a/μm0.002 2 0.001 2 0.001 7 S q/μm0.002 3 0.001 2 0.002 1 S z/μm0.059 0 0.026 3 0.136 3
Table 3.
Deposition process parameters of Nb2O5 and UV-SiO2
Nb2O5和UV-SiO2沉积工艺参数
View tableView in ArticleTable 3.
Deposition process parameters of Nb2O5 and UV-SiO2
Nb2O5和UV-SiO2沉积工艺参数
Material Substrate temperature/℃ Degree of vacuum/Pa Deposition rate/(nm·s−1) Flow rate of O2/sccm Kaufman HPE SiO2 180 1.0×10−3 0.7 5 0 Nb2O5 180 1.0×10−3 0.5 35 15
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Meixuan Li, Siqi Zhang, Hong Li, Nan Li, Yuxuan Ren, Jialong Tian. Research on the bandpass filter used for single-exposure multi-spectral ghost imaging system[J]. Infrared and Laser Engineering, 2020, 49(9): 20200169
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Received: Jun. 7, 2020
Accepted: --
Published Online: Jan. 4, 2021
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