Acta Optica Sinica, Volume. 43, Issue 13, 1326003(2023)

High-Order Bessel Beam Generator with High Laser-Induced Damage Threshold Fabricated by Femtosecond Laser

Zuojiao Zhang1,2, Yao Fang1, Qingsong Wang1, Xiong Li1,2, Mingbo Pu1,2,3, Xiaoliang Ma1,2, and Xiangang Luo1,2、*
Author Affiliations
  • 1State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, Sichuan, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Research Center on Vector Optical Fields, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, Sichuan, China
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    Figures & Tables(10)
    Schematic of the fabrication of geometric phase optical element based on nanograting
    Nanograting structure induced by femtosecond laser. (a) Schematic of the femtosecond laser processing system; (b) SEM image of the nanograting
    SEM images of nanograting induced by different laser polarization directions
    Effect of different pulse densities on phase retardance of nanograting when the processing depth is 200 μm and the pulse energy is 0.3 μJ
    Test results of spiral phase plate. (a) Picture of spiral phase plate; (b) the optical axis distribution of spiral phase plate; (c) the light field distribution of the output passing through the polarizer when the linear polarized light incident on the spiral phase plate; (d) vortex beam generated by circular polarization incident on the spiral phase plate; (e) interference image of vortex beam and plane wave
    Test results of planar axicon. (a) Picture of planar axicon (D=6 mm); (b) the optical axis distribution of planar axicon (D=2.4 mm); (c) the light field distribution measured at 0.5,1,1.5,2 m after the circular polarization incident on planar axicon (D=6 mm); (d) the light intensity distribution in Fig. 6(c)
    Test results of high-order Bessel beam generator. (a) Picture of high-order Bessel beam generator; (b) simulation results of optical axis distribution; (c) measurement results of optical axis distribution; (d) simulation results of light field distribution at 2.5 m; (e) measurement results of light field distribution at 2.5 m; (f) interference image of high-order Bessel beam and spherical wave; (g) interference image of high-order Bessel beam and plane wave
    Far field light distribution of high-order Bessel beam,the measured distance is 3, 3.5, 4, 4.5 m from left to right
    LIDT fitting curve of high-order Bessel beam generator
    • Table 1. Parameters of femtosecond laser processing system

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      Table 1. Parameters of femtosecond laser processing system

      System parameterValue
      Central wavelength /nm1030
      Repetition frequency /kHz200
      Minimum pulse width /fs260
      Laser polarization directionLinear polarization(S)
      Line interval /μm1
      Focus depth /μm200-500
      Objective50×(ANA=0.42)
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    Zuojiao Zhang, Yao Fang, Qingsong Wang, Xiong Li, Mingbo Pu, Xiaoliang Ma, Xiangang Luo. High-Order Bessel Beam Generator with High Laser-Induced Damage Threshold Fabricated by Femtosecond Laser[J]. Acta Optica Sinica, 2023, 43(13): 1326003

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    Paper Information

    Category: Physical Optics

    Received: Jan. 6, 2023

    Accepted: Mar. 12, 2023

    Published Online: Jul. 12, 2023

    The Author Email: Luo Xiangang (lxg@ioe.ac.cn)

    DOI:10.3788/AOS230450

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