3D Rigorous Simulation of Defective Masks used for EUV Lithography via Machine Learning-Based Calibration

Heng Zhang; Sikun Li; Xiangzhao Wang; Wei Cheng

doi:10.3788/AOS201838.1222002

Acta Optica Sinica, Volume. 38, Issue 12, 1222002(2018)

3D Rigorous Simulation of Defective Masks used for EUV Lithography via Machine Learning-Based Calibration

Heng Zhang^1,2、*, Sikun Li^1,2、*, Xiangzhao Wang^1,2、*, and Wei Cheng^1,2

¹ Laboratory of Information Optics and Optelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

² University of Chinese Academy of Sciences, Beijing 100049, China

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[1] LI Guannan, LIU Lituo, ZHOU Weihu, SHI Junkai, CHEN Xiaomei. Study of Defect Perturbation in Reflective Field of EUV Mask Multilayer[J]. Semiconductor Optoelectronics, 2020, 41(2): 217

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Heng Zhang, Sikun Li, Xiangzhao Wang, Wei Cheng. 3D Rigorous Simulation of Defective Masks used for EUV Lithography via Machine Learning-Based Calibration[J]. Acta Optica Sinica, 2018, 38(12): 1222002

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Paper Information

Category: Optical Design and Fabrication

Received: Apr. 18, 2018

Accepted: Jul. 26, 2018

Published Online: May. 10, 2019

The Author Email:

DOI:10.3788/AOS201838.1222002

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology