Acta Photonica Sinica, Volume. 53, Issue 1, 0114003(2024)

Design and Simulation for High-power 1 550 nm Oxide-confinement VCSEL

Wei WANG1、* and Yunfei TAN2
Author Affiliations
  • 1Jiangsu Province Engineering Research Center of Integrated Circuit Reliability Technology and Testing System,Wuxi University,Wuxi 214105,China
  • 2School of Electronic and Information Engineering,Nanjing University of Information Science and Technology,Nanjing 210044,China
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    Figures & Tables(11)
    Operating principle of oxide-confinement VCSEL & standing wave distribution pattern in cavity
    VCSEL models with different oxide-confinements & current injection simulation diagram
    Two VCSEL models with oxide-confinement structures
    Mode gain plot and InP thickness fitting plot of VCSEL with different oxidized aperture
    I-L plots of VCSEL with different oxidized apertures with single oxide-confinement layer
    I-L diagram of VCSEL with an oxidized aperture of 10~12 μm
    I-L plots of VCSEL with different oxide-confinements
    Comparison of L-L and I-V diagrams of chips with or without oxide-confinements in the active region
    Comparison of PCE between two structures
    • Table 1. Active region without oxide-confinement

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      Table 1. Active region without oxide-confinement

      Oxidized aperture/μmIth/mASE/(W·A-1Peak power/(mW@mA)Peak PCE/(%@mA)
      811.77175.45@10036.4@9.1
      911.79177.55@10037.5@10.0
      101.21.77175.58@10037.7@11.4
      1121.63161.23@10037.2@11.1
      122.11.63161.16@10037.5@12.7
      132.41.64162.62@10037.5@13.4
      142.51.58156.14@10035.9@15.5
    • Table 2. Active region with oxide-confinements

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      Table 2. Active region with oxide-confinements

      Oxidized aperture/μmIth/mASE/(W·A-1Peak power/(mW@mA)Peak PCE/(% @mA)
      812.26135.72@6110.0@2.9
      912.36155.66@6711.1@3.4
      101.32.32169.36@7511.1@4.3
      111.72.26178.53@8110.4@6
      122.22.16192.21@909.51@8.2
      132.82.01189.22@958.4@11.5
      143.51.78175.87@1007.1@14.7
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    Wei WANG, Yunfei TAN. Design and Simulation for High-power 1 550 nm Oxide-confinement VCSEL[J]. Acta Photonica Sinica, 2024, 53(1): 0114003

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    Paper Information

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    Received: Jul. 3, 2023

    Accepted: Aug. 14, 2023

    Published Online: Feb. 1, 2024

    The Author Email: Wei WANG (860009@cwxu.edu.cn)

    DOI:10.3788/gzxb20245301.0114003

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