Infrared and Laser Engineering, Volume. 48, Issue 12, 1215001(2019)

Lithography system holistic optimization with low stage vibration sensitivity

Sheng Naiyuan*... Li Yanqiu, Wei Pengzhi and Liu Lihui |Show fewer author(s)
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    References(13)

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    Sheng Naiyuan, Li Yanqiu, Wei Pengzhi, Liu Lihui. Lithography system holistic optimization with low stage vibration sensitivity[J]. Infrared and Laser Engineering, 2019, 48(12): 1215001

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    Paper Information

    Received: Jun. 5, 2019

    Accepted: Jul. 15, 2019

    Published Online: Feb. 11, 2020

    The Author Email: Naiyuan Sheng (shengnaiyuan123@qq.com)

    DOI:10.3788/irla201948.1215001

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