Chinese Optics Letters, Volume. 10, Issue s2, S21403(2012)
Feature width miniaturization in atom nanolithography with double standing wave layers
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Pingping Zhang, Yan Ma, Tongbao Li. Feature width miniaturization in atom nanolithography with double standing wave layers[J]. Chinese Optics Letters, 2012, 10(s2): S21403
Category: Lasers and Laser Optics
Received: Apr. 3, 2012
Accepted: Jun. 26, 2012
Published Online: Dec. 6, 2012
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