Opto-Electronic Engineering, Volume. 50, Issue 2, 220226(2023)
Displacement measurement analysis in distortion detection of lithography projection objective
Figures & Tables(19)
Fig. 1. Schematic diagram of the projection objective distortion measurement
Fig. 2. Structural schematic diagram of the projection objective image quality detection platform
Fig. 5. Internal structural object picture of the projection objective image quality detection platform
Fig. 7. Arrangement diagram of the dual-frequency laser interferometer
Fig. 10. Constant temperature chamber and control cabinet of the micro-environment control system
Fig. 12. Schematic diagram of the horizontal abbe error in distortion measurement
Table 1. Instrument errors summary of the dual-frequency laser interferometer
View tableView in ArticleTable 1. Instrument errors summary of the dual-frequency laser interferometer
仪器误差 3σ/nm 相关参数 参数值 波长稳定性误差 0.25 被测行程+死程/mm 40+80 电细分误差 0.31 分辨率/nm 0.31 光学非线性误差 1.5 固定值/nm 1.5 数据采集误差 0.01 被测速度/(m/s) 0.01 光束平行度误差 0.04 被测行程/mm 40 合计 1.55
Table 2. Geometrical errors summary of the dual-frequency laser interferometer
View tableView in ArticleTable 2. Geometrical errors summary of the dual-frequency laser interferometer
几何误差 使用六自由度解算模型3σ/nm 未使用六自由度解算模型3σ/nm 相关参数 参数值 阿贝误差 0.25 1.2 阿贝臂/mm 6 最大俯仰角/μrad 0.2 余弦误差 0.31 5.5 测量行程/mm 40 光轴与运动方向夹角/mrad 0.5 反射镜面形误差 1 30 测量范围/mm 40×40 面形加工误差/nm 30 合计 1.08 30.52
Table 3. System parameters of the micro-environment control system
View tableView in ArticleTable 3. System parameters of the micro-environment control system
类别 参数 运行环境温度/(℃) 22±2 运行环境温度变化梯度/(℃/min) ≤0.5 温度设定范围/(℃) 21~−23 全局气浴温度稳定性 ±0.1 ℃@8 h 局部气浴温度稳定性 ±0.01 ℃@4 h
Table 4. Environmental errors summary of the dual-frequency laser interferometer
View tableView in ArticleTable 4. Environmental errors summary of the dual-frequency laser interferometer
环境误差 3σ/nm 相关参数/mm 参数值 被测行程长度误差 1.63 被测行程 40 干涉仪热漂移 0.4 - - 材料热膨胀 0.8 干涉仪离反射镜最大距离 128 死程误差 4.5 死程长度 80 机械振动 1 - - 合计 4.97
Table 5. Positon measurement reproducibility of the image quality detection platform
View tableView in ArticleTable 5. Positon measurement reproducibility of the image quality detection platform
点序号 X轴复现性/nm Y轴复现性/nm 点序号 X轴复现性/nm Y轴复现性/nm 1 12.29 2.63 14 2.74 7.06 2 12.69 0.93 15 2.76 8.30 3 14.26 0.17 16 3.73 9.56 4 17.42 0.59 17 7.73 7.09 5 13.70 0.40 18 6.55 10.43 6 8.81 1.82 19 3.36 8.46 7 6.12 3.79 20 2.93 7.35 8 8.86 2.79 21 3.70 10.74 9 9.65 0.87 22 1.40 9.4 10 7.97 0.77 23 0.56 8.01 11 1.57 4.23 24 0.11 6.57 12 2.17 9.51 25 0.74 11.96 13 0.46 6.19
Table 6. Positon measurement reproducibility of the image quality detection platform (micro-environment control system off)
View tableView in ArticleTable 6. Positon measurement reproducibility of the image quality detection platform (micro-environment control system off)
点序号 X轴复现性/nm Y轴复现性/nm 点序号 X轴复现性/nm Y轴复现性/nm 1 90.38 62.10 14 204.77 185.13 2 130.90 50.33 15 228.85 74.61 3 104.52 145.49 16 236.94 103.03 4 128.89 27.5 17 270.60 159.11 5 141.70 92.99 18 243.22 177.69 6 170.90 153.34 19 252.73 171.02 7 154.09 156.13 20 235.13 174.26 8 190.73 152.25 21 218.89 173.47 9 181.26 160.74 22 207.70 170.62 10 189.27 165.97 23 210.58 147.87 11 210.64 187.02 24 219.43 169.11 12 218.64 185.13 25 235.15 186.93 13 186.24 167.52
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Jing Du, Junbo Liu, Haiyang Quan, Song Hu. Displacement measurement analysis in distortion detection of lithography projection objective[J]. Opto-Electronic Engineering, 2023, 50(2): 220226
Paper Information
Category: Article
Received: Sep. 15, 2022
Accepted: Nov. 11, 2022
Published Online: Apr. 13, 2023
The Author Email: Hu Song (husong@ioe.ac.cn)
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