Electro-Optic Technology Application, Volume. 27, Issue 4, 39(2012)
Research on Improving Monocrystal Silicon Wafer Texture Effect by Hydrogen Peroxide Method
[4] [4] Elena M, et al. Technological Process for a New Silicon So.lar Cell Structure with Honeycomb Textured Front Surface[J]. SolarEnergy Materials and Solar Cells, 2006, 90( 15): 2312-2318.
[5] [5] Lim S W. Control of SC1 wet cleaning process of nano-scalegate oxide integrity[J]. Jpn J Appl Phys., 2003, 42(8): 5002-5004.
[6] [6] amamoto K, Nakamura A, Hase U. Control of cleaning per.formance of an ammonia and hydrogen peroxide mixture(AMP) on the basis of a kinetic reaction model[J]. IEEETrans Semicond Manuf., 1999, 12 (3) :288.
[8] [8] CHU Jia, MA Xiang-yang, YANG De-ren, et al. Silicon wa. fer cleaning[J]. Semiconductor Technology, 2001, 26(2): 17-20.
[10] [10] Itano M, Kern F W. Particler emoval from silicon wafersurface in wet cleaning process[J].IEEE Trans Semicon. ductor Manufacturing, 1993, 6(3): 258-261.
Get Citation
Copy Citation Text
HAN Li, GAO Hua, ZHANG Wen-bin, YANG Le, LI Xing-bing, DAI Li-li. Research on Improving Monocrystal Silicon Wafer Texture Effect by Hydrogen Peroxide Method[J]. Electro-Optic Technology Application, 2012, 27(4): 39
Category:
Received: Jun. 4, 2012
Accepted: --
Published Online: Aug. 31, 2012
The Author Email:
CSTR:32186.14.