Radiation characteristic measurement of low temperature plasma under atmospheric pressure

[in Chinese]; [in Chinese]

Opto-Electronic Engineering, Volume. 34, Issue 1, 41(2007)

[in Chinese] and [in Chinese]

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[in Chinese]

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References(1)

[1] [1] ROTH J R.Industrial Plasma Engineering -Volume 2:Applications To Nonthermal Plasma Processing[M].Bristol and Philadelphia,London:Institute of Physics Publishing,2001.

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[in Chinese], [in Chinese]. Radiation characteristic measurement of low temperature plasma under atmospheric pressure[J]. Opto-Electronic Engineering, 2007, 34(1): 41

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