Laser & Optoelectronics Progress, Volume. 55, Issue 4, 040201(2018)
Fabrication and Study of Micro Alkali-Metal Vapor Cell Applied to Chip Scale Atomic Clock
By using the inductively coupled plasma (ICP) deep silicon etching machine and the anodic bonding system, the alkali-metal vapor cell applied to the chip scale atomic clock (CSAC) is fabricated. With the AZ4620 photoresist as a mask, the silicon surface morphology after deep silicon etching is studied and the deep silicon etching rates under different structures are compared. The micro alkali-metal vapor cell with a sandwich structure is obtained by using the anodic bonding, and the saturation absorption line is detected. The experimental results show that a significant saturated absorption phenomenon is observed in the fabricated micro alkali-metal vapor cell when the temperature is 80 ℃.
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Yue Tang, Ziming Ren, Yunchao Li, Xuwen Hu, Yanjun Zhang, Shubin Yan. Fabrication and Study of Micro Alkali-Metal Vapor Cell Applied to Chip Scale Atomic Clock[J]. Laser & Optoelectronics Progress, 2018, 55(4): 040201
Category: Atomic and Molecular Physics
Received: Oct. 26, 2017
Accepted: --
Published Online: Sep. 11, 2018
The Author Email: Yan Shubin (shubin_yan@nuc.edu.cn)