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Acta Photonica Sinica, Volume. 46, Issue 4, 404001(2017)

Research on High Micro Element Density Silicon Photomultiplier Based on Epitaxial Quenching Resistance

JIA Jian-quan1,2、*, JIANG Jia-li1,2, LI Bai-cheng1,2, WANG Rui-heng1,2, LIANG Kun1,2, YANG Ru1,2, and HAN De-jun1,2
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    JIA Jian-quan, JIANG Jia-li, LI Bai-cheng, WANG Rui-heng, LIANG Kun, YANG Ru, HAN De-jun. Research on High Micro Element Density Silicon Photomultiplier Based on Epitaxial Quenching Resistance[J]. Acta Photonica Sinica, 2017, 46(4): 404001

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    Paper Information

    Received: Oct. 12, 2016

    Accepted: --

    Published Online: May. 3, 2017

    The Author Email: Jian-quan JIA (1107509582@qq.com)

    DOI:10.3788/gzxb20174604.0404001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology