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Electro-Optic Technology Application, Volume. 24, Issue 6, 19(2009)

Attenuation and Reflection of Electromagnetic Wave in Uniform Magnetized Plasma

LV Dan1...2 and TONG Chuangming12 |Show fewer author(s)
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    LV Dan, TONG Chuangming. Attenuation and Reflection of Electromagnetic Wave in Uniform Magnetized Plasma[J]. Electro-Optic Technology Application, 2009, 24(6): 19

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    Paper Information

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    Received: Sep. 1, 2009

    Accepted: --

    Published Online: May. 10, 2010

    The Author Email:

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology