Semiconductor Optoelectronics, Volume. 41, Issue 3, 395(2020)

Design of Homogenizing Optical System for Testing CMOS Image Sensor in Deep Ultraviolet Region

LI Qi1,2, QI Yuejing1,2、*, LU Zengxiong1,2, ZHANG Qingyang1, MA Jing1, YANG Guanghua1,2, and SU Jiani1
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  • 2[in Chinese]
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    References(4)

    [1] [1] Kerkhof M A V D, Boeij W D, Kok H, et al. Full optical column characterization of DUV lithographic projection tools[J]. Proc. of SPIE, 2004, 5377: 1960-1970.

    [5] [5] European Machine Vision Association. Standard for characterization of image sensors and cameras[S]. Germany: EMVA Standard 1288, 2010.

    [13] [13] Dickey F M, Lizotte T E. Laser Beam Shaping Applications[M]. 2nd Edi., UK: CRC Press, 2016.

    [14] [14] Focus Software Zemax. Optical Design Program User’s Guide[M]. USA: Focus Software Incorporated, 2001: 257.

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    LI Qi, QI Yuejing, LU Zengxiong, ZHANG Qingyang, MA Jing, YANG Guanghua, SU Jiani. Design of Homogenizing Optical System for Testing CMOS Image Sensor in Deep Ultraviolet Region[J]. Semiconductor Optoelectronics, 2020, 41(3): 395

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    Paper Information

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    Received: Feb. 12, 2020

    Accepted: --

    Published Online: Jun. 18, 2020

    The Author Email: Yuejing QI (qiyuejing@ime.ac.cn)

    DOI:10.16818/j.issn1001-5868.2020.03.018

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