Semiconductor Optoelectronics, Volume. 41, Issue 3, 395(2020)
Design of Homogenizing Optical System for Testing CMOS Image Sensor in Deep Ultraviolet Region
[1] [1] Kerkhof M A V D, Boeij W D, Kok H, et al. Full optical column characterization of DUV lithographic projection tools[J]. Proc. of SPIE, 2004, 5377: 1960-1970.
[5] [5] European Machine Vision Association. Standard for characterization of image sensors and cameras[S]. Germany: EMVA Standard 1288, 2010.
[13] [13] Dickey F M, Lizotte T E. Laser Beam Shaping Applications[M]. 2nd Edi., UK: CRC Press, 2016.
[14] [14] Focus Software Zemax. Optical Design Program User’s Guide[M]. USA: Focus Software Incorporated, 2001: 257.
Get Citation
Copy Citation Text
LI Qi, QI Yuejing, LU Zengxiong, ZHANG Qingyang, MA Jing, YANG Guanghua, SU Jiani. Design of Homogenizing Optical System for Testing CMOS Image Sensor in Deep Ultraviolet Region[J]. Semiconductor Optoelectronics, 2020, 41(3): 395
Category:
Received: Feb. 12, 2020
Accepted: --
Published Online: Jun. 18, 2020
The Author Email: Yuejing QI (qiyuejing@ime.ac.cn)