A novel laser shock post-processing technique on the laser-induced damage resistance of 1ω HfO<sub>2</sub>/SiO<sub>2</sub> multilayer coatings

Tangyang Pu; Wenwen Liu; Yueliang Wang; Xiaoming Pan; Leiqing Chen; Xiaofeng Liu

doi:10.1017/hpl.2021.4

High Power Laser Science and Engineering, Volume. 9, Issue 2, 02000e19(2021)

A novel laser shock post-processing technique on the laser-induced damage resistance of 1ω HfO₂/SiO₂ multilayer coatings

Tangyang Pu¹, Wenwen Liu^1、*, Yueliang Wang², Xiaoming Pan¹, Leiqing Chen¹, and Xiaofeng Liu³

Author Affiliations

¹College of Mechanical and Electrical Engineering, Wenzhou University, Wenzhou325035, China

²National Engineering Laboratory for Modern Materials Surface Engineering Technology, Institute of New Materials, Guangdong Academy of Sciences, Guangzhou510651, China

³Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Shanghai201800, China

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Tangyang Pu, Wenwen Liu, Yueliang Wang, Xiaoming Pan, Leiqing Chen, Xiaofeng Liu. A novel laser shock post-processing technique on the laser-induced damage resistance of 1ω HfO₂/SiO₂ multilayer coatings[J]. High Power Laser Science and Engineering, 2021, 9(2): 02000e19

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Paper Information

Category: Research Articles

Received: Nov. 12, 2020

Accepted: Jan. 19, 2021

Published Online: May. 18, 2021

The Author Email: Wenwen Liu (sophialww@163.com)

DOI:10.1017/hpl.2021.4

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology