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International Journal of Extreme Manufacturing, Volume. 2, Issue 1, 12005(2020)

The recent development of soft x-ray interference lithography in SSRF

Jun Zhao1...2, Shumin Yang1,2, Chaofan Xue1,2, Liansheng Wang1,2, Zhaofeng Liang1, Lei Zhang2, Yong Wang1,2, Yanqing Wu1,2,*, and Renzhong Tai12 |Show fewer author(s)
Author Affiliations
  • 1Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, CAS, Shanghai, People’s Republic of China
  • 2Shanghai Institute of Applied Physical, CAS, Shanghai, People’s Republic of China
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    Jun Zhao, Shumin Yang, Chaofan Xue, Liansheng Wang, Zhaofeng Liang, Lei Zhang, Yong Wang, Yanqing Wu, Renzhong Tai. The recent development of soft x-ray interference lithography in SSRF[J]. International Journal of Extreme Manufacturing, 2020, 2(1): 12005

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    Paper Information

    Category: Topical Review

    Received: Dec. 3, 2019

    Accepted: --

    Published Online: Jun. 4, 2020

    The Author Email: Wu Yanqing (wuyanqing@sinap.ac.cn and tairenzhong@sinap.ac.cn)

    DOI:10.1088/2631-7990/ab70ae

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology