Laser & Optoelectronics Progress, Volume. 56, Issue 6, 062402(2019)

Influence of Chemical Polishing on Performances of Silicon Heterojunction Solar Cells

Yuanjian Jiang1、*, Xiaodan Zhang2, and Ying Zhao2
Author Affiliations
  • 1 College of Physics and Electronic Engineering, Heze University, Heze, Shandong 274015, China
  • 2 Key Laboratory of Optoelectronic Thin Film Devices and Technology of Tianjin City, Institute of Photo-Electronic Thin Film Devices and Technology, Nankai University, Tianjin 300071, China
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    Aim

    ing to avoid the local epitaxial growth of amorphous silicon films in the pyramidal valleys of the textured silicon wafers, a chemical polishing mixture named CP133 is used to polish the textured crystalline silicon (c-Si) surfaces. The research results show that the morphologies of the pyramidal valleys change from V shape to U shape, which clearly improves the passivation effect at the hydrogenated amorphous silicon/crystalline silicon interface. When the temperature is lower than 30 ℃, the solution is difficult to react with the crystalline silicon. However, the problem can be solved by the increase of the solution temperature up to 35 ℃. The performance of the solar cells is relatively good when the polishing time is 30 s and the NaOH texturing solution has a mass fraction of 1%.

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    Yuanjian Jiang, Xiaodan Zhang, Ying Zhao. Influence of Chemical Polishing on Performances of Silicon Heterojunction Solar Cells[J]. Laser & Optoelectronics Progress, 2019, 56(6): 062402

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    Paper Information

    Category: Optics at Surfaces

    Received: Aug. 31, 2018

    Accepted: Oct. 19, 2018

    Published Online: Jul. 30, 2019

    The Author Email: Jiang Yuanjian (jiyjok3@sina.com)

    DOI:10.3788/LOP56.062402

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