[1] Chen X W, Chen L, Wang Y et al. AgGeSbTe thin film as a negative heat-mode resist for dry lithography[J]. Chinese Optics Letters, 20, 031601(2022).

[2] Wang S M, Zhao J H, Gu J J et al. LiNbO3 channel and ridge waveguides based on helium ion implantation combined with lithography and precise diamond dicing[J]. Chinese Optics Letters, 20, 071301(2022).

[3] Du J Y, Dai F Z, Wang X Z. Calibration method for alignment error caused by asymmetric deformation of mark and its application in overlay measurement[J]. Chinese Journal of Lasers, 46, 0704004(2019).

[4] Yang G H, Wang Y, Li J et al. Effect of phase grating asymmetry on position measurement accuracy[J]. Acta Optica Sinica, 41, 1905001(2021).

[5] Cui Y T, Goodwin F, van Haren R. Segmented alignment mark optimization and signal strength enhancement for deep trench process[J]. Proceedings of SPIE, 5375, 1265-1277(2004).

[6] Du J Y. Research on projection mask aligner alignment technology based on phase diffraction grating[D], 80-87(2019).

[7] Zhou G Y, Qi Y J, Qi W et al. Design method of phase grating mark in resonance domain[J]. Acta Optica Sinica, 42, 2105001(2022).

[8] Yang G H, Wang Y, Li J et al. Diffraction efficiency of enhanced phase grating[J]. Acta Optica Sinica, 41, 1205001(2021).

[9] Li L, Chen C, Zeng H et al. Analysis of diffraction-based wafer alignment rejection for thick aluminum process[J]. Journal of Vacuum Science and Technology, 40, 022603(2022).

[10] Wu Q, Williams G, Kim B Y et al. Ultrafast wafer alignment simulation based on thin film theory[J]. Proceedings of SPIE, 4689, 364-373(2002).

[11] Zhang L, Dong L, Su X et al. New alignment mark designs in single patterning and self-aligned double patterning[J]. Microelectronic Engineering, 179, 18-24(2017).

[12] Shin J, Chalykh R, Kang H et al. Overlay metrology for dark hard mask process: simulation and experiment study[J]. Proceedings of SPIE, 6518, 65182U(2007).

[13] Yun S, Ha S M, Nam Y M et al. A comparison of alignment and overlay performance with varying hardmask materials[J]. Proceedings of SPIE, 8324, 832407(2012).

[14] Ahn J K, Ha J H, Kim H I et al. Optimization of alignment strategy for metal layer on local interconnect integration[J]. Proceedings of SPIE, 7272, 7272(2009).

[15] Chen Q, Li G J, Fang L et al. Design of wide-angle laser beam splitter with sub-wavelength multi-level structure[J]. Chinese Journal of Lasers, 43, 0205006(2016).

[16] Zhao H J[M]. Subwavelength grating optics(2017).

[17] Hao Y W, Kong X X, Cai Q S et al. Analysis of effect of circulator noise on laser interferometry system[J]. Acta Optica Sinica, 41, 0912003(2021).

[18] Leray P, Jehoul C, Socha R et al. Improving scanner wafer alignment performance by target optimization[J]. Proceedings of SPIE, 9778, 97782M(2016).

[19] Xu M N, Lu Z X, Qi Y J et al. Influence of beam polarization on contrast of self-referencing interference signal[J]. Laser & Optoelectronics Progress, 58, 2326002(2021).

[20] Wei Y Y[M]. Theory and application of advanced lithography for VLSI(2016).

[21] Hermans J V, Baudemprez B, Lorusso G et al. Stability and imaging of the ASML EUV alpha demo tool[J]. Proceedings of SPIE, 7271, 72710T(2009).

[22] Jeong I H, Kim H S, Kong Y O et al. Improved wafer alignment model algorithm for better on-product overlay[J]. Proceedings of SPIE, 10961, 10961(2019).