High Power Laser Science and Engineering, Volume. 11, Issue 6, 06000e89(2023)

Nanosecond laser conditioning of multilayer dielectric gratings for picosecond–petawatt laser systems

Kun Shuai1,2,3, Yuanan Zhao1,2,3、*, Xiaofeng Liu1,2,3、*, Xiangkun Lin1,2,3, Zhilin Xia4, Keqiang Qiu5, Dawei Li1,3, He Gong1,6, Yan Zhou1,6, Jian Sun1,3, Li Zhou7, Youen Jiang7, Yaping Dai8, and Jianda Shao1,3,9
Author Affiliations
  • 1Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences (CAS), Shanghai, China
  • 2Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, China
  • 3Key Laboratory of Materials for High Power Laser, Chinese Academy of Sciences, Shanghai, China
  • 4School of Materials Science and Engineering, Wuhan University of Technology, Wuhan, China
  • 5National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei, China
  • 6School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai, China
  • 7National Laboratory on High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, CAS, Shanghai, China
  • 8Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang, China
  • 9Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, China
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    Figures & Tables(14)
    Schematic representation of the nanosecond and picosecond laser damage tests performed on three types of MLDG samples: (a) unconditioned MLDG, (b) MLDF conditioning and (c) MLDG conditioning. (d) Schematic of the raster scan damage tests.
    OM images of the nodular ejection pits and plasma scalds originating from Protocol 1. (a), (b) Before photoresist spin-coating after MLDF conditioning. (c), (d) After photoresist spin-coating. (e), (f) After MLDG cleaning.
    SEM images of the nodular defect and ejection pits at the different MLDG fabrication stages. (a) Typical bulged nodular defect in the MLDF and (b)–(d) morphologies of the nodular ejection pits after the MLDF conditioning, photoresist spin-coating and grating cleaning, respectively.
    (a) Typical cross-sectional morphology of a nodular defect in the unconditioned MLDG. (b), (c) SEM images of the typical nodular ejection pits caused by Protocols 1 and 2, respectively. (d)–(f) Simulated distributions corresponding to the morphological structures in (a)–(c), respectively.
    (a) SEM image of the plasma-scalding region induced by the NLC in Protocol 1; the inset image shows a local magnified view of the nodular ejection pit. (b)−(g) Local magnified SEM images of the positions marked by rectangles (in color) in (a).
    (a) SEM image of the plasma-scalding region induced by the NLC in Protocol 2; the inset image indicates the local magnified view of the central nodular ejection pit. (b)−(g) Local magnified SEM images of the positions marked by rectangles (in color) in (a).
    (a) LIDT results of the nanosecond laser raster scan; the two thresholds represent the results of two different test samples. (b) Damage density versus laser fluence (only the damage points that appear in the nanosecond laser damage test process are counted as damage).
    (a) OM image showing the pristine morphological modifications of the three nodular ejection pits induced by the NLC in Protocol 1. (b)–(f) OM images showing the morphologies of the ejection pit areas irradiated by gradually increasing nanosecond laser fluences; here, the red lines represent the nodular ejection pits on the MLDG.
    (a) OM image showing the pristine morphological modifications of a nodular ejection pit induced by the NLC in Protocol 2. (b)–(f) Ejection pit region irradiated by gradually increasing nanosecond laser fluences.
    Picosecond-LIDTs of the unconditioned nodule and nodular ejection pits conditioned by Protocols 1 and 2.
    Typical morphological characteristics of the different test areas induced during the picosecond laser damage test. (a), (d) Unconditioned nodular defects. (b), (e) Nodular ejection pits caused by Protocol 1. (c), (f) Nodular ejection pits caused by Protocol 2 (where F denotes the incident laser fluence).
    (a) OM image showing the pristine morphological modification of a nodular ejection pit in Protocol 1. (b)–(f) OM images showing the morphologies of the ejection pit area irradiated by the gradually increasing picosecond laser fluences.
    (a) OM image showing the pristine morphological modification of a nodular ejection pit in Protocol 2. (b)–(f) OM images showing the morphologies of the ejection pit area irradiated by the gradually increasing picosecond laser fluences.
    • Table 1. Model parameters used in the calculations.

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      Table 1. Model parameters used in the calculations.

      Parameter $d$ $t$ nLnHWavelengthIncidencePolarization
      Value1 μm4.5 μm1.4531.9621064 nm67°TE
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    Kun Shuai, Yuanan Zhao, Xiaofeng Liu, Xiangkun Lin, Zhilin Xia, Keqiang Qiu, Dawei Li, He Gong, Yan Zhou, Jian Sun, Li Zhou, Youen Jiang, Yaping Dai, Jianda Shao. Nanosecond laser conditioning of multilayer dielectric gratings for picosecond–petawatt laser systems[J]. High Power Laser Science and Engineering, 2023, 11(6): 06000e89

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    Paper Information

    Category: Research Articles

    Received: Jun. 27, 2023

    Accepted: Sep. 7, 2023

    Published Online: Dec. 14, 2023

    The Author Email: Yuanan Zhao (yazhao@siom.ac.cn), Xiaofeng Liu (liuxiaofeng@siom.ac.cn)

    DOI:10.1017/hpl.2023.74

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