Fig. 1. Schematic diagram of MCF polishing device

Fig. 2. Polishing device of MCF polishing process

Fig. 3. Images of polished surface and measured infrared temperature

Fig. 4. Surface roughness， decline rate and material removal change with time

Fig. 5. MCF morphologies of different water content before and after polishing

Fig. 6. Variation of polishing temperature with time for different components of MCF

Fig. 7. Normal force of MCF with different water content over time

Fig. 8. Formation mechanism of clustered structures with different water content

Fig. 9. Changes of surface roughness， decline rate and material removal with polishing time

Fig. 10. Morphologies of MCF2 at different polishing time with supplying water

Fig. 11. Polishing temperature variation of MCF over time with supplementary water

Fig. 12. Normal force variation of MCF over time with supplementary water