Optics and Precision Engineering, Volume. 16, Issue 3, 392(2008)

Design of low loss 193 nm HR mirror

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    References(9)

    [2] [2] KENNEDY M,RISTAU D,NIEDERWALD H S.Ion beam-assisted deposition of MgF2 and YbF3 films[J].Thin Solid Films,1998,333:191-195.

    [3] [3] JACOB D,PEIRO F,RISTAU D.Microstructure and composition of MgF2 optical coatings grown on Si substrate by PVD and IBS processes[J].Thin Solid Films,2000,360:133-138.

    [4] [4] YUSUKE T,KENICHI M.Hetero-epitaxial growth and optical properties of LaF3 on CaF2[J].Thin Solid Films,2002,420-421:30-37.

    [5] [5] RISTAU D,GUNSTER S,BOSCH S,et al..Ultraviolet optical and microstruetural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation[J].Applied Optics,2002,41 (16):3196-3204.

    [6] [6] VUAYAKUMAR M.SELVAsEKARAPANDIAN S,GNANASEKARAN T,et al..Structural and impedance studies on LaF3 thin films prepared by vacuum evaporation[J].Journal of Fluorine Chemistry,2004,125:1119-1125.

    [7] [7] GLEN P C,BRUCE K F.Characteristics of deep UV optics at 193 am & 157 nm[J].SPIE,1998,3578:45-53.

    [8] [8] LIBERMAN V.ROTHSCHILD M,SEDLACEK J H C,et al..Excimer-laser-induced degradation of fused silica and calcium fluoride for 193 nm lithographic applications[J].Optics Letters,1999,24(1):58-60.

    [9] [9] SAHOO N K.THAKUR S,SENTHILKUMAR M,et al..Reactive electron beam evaporation of gadolinium oxide opticai thin films for ultraviolet and deep ultraviolet laser wavelengths[J].Thin Solid Films,2003,440(1/2):155-168.

    [10] [10] SHANG S Z.SHAO J D.LIAO C Y,et al..High-reflectance 193 nm Al2O3/MgF2 mirrors[J].Applied Surface Science,2005,249:157-161.

    CLP Journals

    [1] LI Mei-xuan, LI Hong, ZHANG Si-qi, GUO Ming, FU Xiu-hua. Mirrors of Beam Stabilization System for Immersion Lithography[J]. Acta Photonica Sinica, 2019, 48(2): 222003

    [2] Chang Yanhe, Jin Chunshui, Li Chun, Deng Wenyuan, Kuang Shangqi, Jin Jingcheng. Optical Properties of Oxide Thin Films for Deep Ultraviolet[J]. Chinese Journal of Lasers, 2011, 38(12): 1207004

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    [in Chinese], [in Chinese], [in Chinese]. Design of low loss 193 nm HR mirror[J]. Optics and Precision Engineering, 2008, 16(3): 392

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    Paper Information

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    Received: Nov. 20, 2007

    Accepted: --

    Published Online: Jul. 8, 2008

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