Acta Photonica Sinica, Volume. 36, Issue 6, 1097(2007)
Properties of Silicon Nitride Films Deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition
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[in Chinese]. Properties of Silicon Nitride Films Deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition[J]. Acta Photonica Sinica, 2007, 36(6): 1097
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