Acta Photonica Sinica, Volume. 34, Issue 5, 758(2005)

Design and Fabrication of Anti-reflection Coating for 1.55 μm Polarization-insensitive Semiconductor Optical Amplifiers

[in Chinese]1,2, [in Chinese]1, [in Chinese]2, and [in Chinese]2
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  • 1[in Chinese]
  • 2[in Chinese]
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    TiO_2/SiO_2 multiple layers anti-refledtion (AR) coatings for the facets of 1.55 μm polarization insensitive semiconductor optical amplifiers were designed and fabricated. Less than 5×10 -4 reflectivities were obtained for both two layers and four layers AR coatings. An In-Situ monitoring for reflectivity was designed and employed during the coating process. The amplifier was fabricated forming ridge waveguide structure with 7° tilted cavity, which showed a less than 0.4 dB ASE ripple, a more than 52 nm bandwidth, excellent polarization insensitivity (less than 0.5 dB) over the entire range of wavelength (1.52~1.58 μm) and a gain of 27 dB at bias current of 200 mA and 1550 nm wavelength.

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Design and Fabrication of Anti-reflection Coating for 1.55 μm Polarization-insensitive Semiconductor Optical Amplifiers[J]. Acta Photonica Sinica, 2005, 34(5): 758

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    Paper Information

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    Received: Apr. 16, 2004

    Accepted: --

    Published Online: Jun. 12, 2006

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