Optical wafer defect inspection at the 10 nm technology node and beyond

Jinlong Zhu; Jiamin Liu; Tianlai Xu; Shuai Yuan; Zexu Zhang; Hao Jiang; Honggang Gu; Renjie Zhou; Shiyuan Liu

doi:10.1088/2631-7990/ac64d7

International Journal of Extreme Manufacturing, Volume. 4, Issue 3, 32001(2022)

Optical wafer defect inspection at the 10 nm technology node and beyond

Jinlong Zhu1,*... Jiamin Liu1, Tianlai Xu2, Shuai Yuan2, Zexu Zhang2, Hao Jiang1, Honggang Gu1, Renjie Zhou3 and Shiyuan Liu1 |Show fewer author(s)

Author Affiliations

¹State Key Laboratory of Digital Manufacturing Equipment and Technology, Huazhong University of Science and Technology, Wuhan 430074, People’s Republic of China

²School of Astronautics, Harbin Institute of Technology, Harbin 150001, People’s Republic of China

³Department of Biomedical Engineering, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong SAR, People’s Republic of China

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Jinlong Zhu, Jiamin Liu, Tianlai Xu, Shuai Yuan, Zexu Zhang, Hao Jiang, Honggang Gu, Renjie Zhou, Shiyuan Liu. Optical wafer defect inspection at the 10 nm technology node and beyond[J]. International Journal of Extreme Manufacturing, 2022, 4(3): 32001

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Paper Information

Category: Topical Review

Received: Jan. 21, 2022

Accepted: --

Published Online: Jan. 23, 2023

The Author Email: Zhu Jinlong (jinlongzhu03@hust.edu.cn)

DOI:10.1088/2631-7990/ac64d7

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology

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