Infrared and Laser Engineering, Volume. 50, Issue 4, 20200231(2021)

Photoelectric characteristics of HgCdTe with Au-doping

Yanfeng Wei, Quanzhi Sun, Juan Zhang, and Ruiyun Sun
Author Affiliations
  • Key Laboratory of Infrared Image Materials and Devices, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China
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    Figures & Tables(8)
    Schematic of the Hg-rich annealing experiment
    Results of the temperature dependent Hall in different annealing conditions
    Distribution of Au in the HgCdTe (SIMS)
    Schematic of the blackbody response measurement
    Layout of the pixels and the wiring in the testing chip (partial)
    • Table 1. [in Chinese]

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      Table 1. [in Chinese]

      SamplesCd compositionConcentration of doped AuAnnealing condition
      LPEV0958A0.219 78.0E+16Hg-rich1
      LPEV09560.216 08.0E+16Hg-rich1
      LPEV1042C0.217 71.0E+16Hg-rich2
      LPEV0978D0.222 31.0E+16Hg-rich2
      LPEV1022D0.218 71.0E+16Hg-rich2
      LPEV0804C0.218 41.0E+16Te-Rich
    • Table 2. [in Chinese]

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      Table 2. [in Chinese]

      Label of the pixelTest conditionsResponse voltage /µV
      D1-1 119
      D2 is short-circuited707.9
      D5 is short-circuited696.1
      D3 is short-circuited764.4
      D7 is short-circuited791
      D4 is short-circuited789.7
      D8 is short-circuited798.5
      D6 is short-circuited773.6
      D9 is short-circuited809.5
    • Table 3. [in Chinese]

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      Table 3. [in Chinese]

      Label of the pixelTest conditionsResponse voltage/µV
      D6-1 182
      D1-D5,D7-D9 are short-circuited94.7
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    Yanfeng Wei, Quanzhi Sun, Juan Zhang, Ruiyun Sun. Photoelectric characteristics of HgCdTe with Au-doping[J]. Infrared and Laser Engineering, 2021, 50(4): 20200231

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    Paper Information

    Category: Infrared technology and application

    Received: Jun. 10, 2020

    Accepted: --

    Published Online: Jul. 30, 2021

    The Author Email:

    DOI:10.3788/IRLA20200231

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