Optical Instruments, Volume. 44, Issue 3, 56(2022)

Optimization of the neutrality of Ni80Cr20 thin films

Xiu JIN... Yongxi ZHANG, Peiwen LIU, He ZHANG, Zhonglian WANG and Chao BAN |Show fewer author(s)
Author Affiliations
  • Shenyang Academy of Instrumentation Sciences Co., Ltd., Shenyang 110043 China
  • show less
    References(2)

    [10] PATTERSON W L, SHIM G A. The sputtering of nickel-chromium alloys[J]. Journal of Vacuum Science and Technology, 4, 343-346(1967).

    [11] HONIG R E, KRAMER D A. Vapor pressure data for the solid and liquid elements[J]. RCA Review, 30, 285-305(1969).

    Tools

    Get Citation

    Copy Citation Text

    Xiu JIN, Yongxi ZHANG, Peiwen LIU, He ZHANG, Zhonglian WANG, Chao BAN. Optimization of the neutrality of Ni80Cr20 thin films[J]. Optical Instruments, 2022, 44(3): 56

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: DESIGN AND RESEARCH

    Received: Oct. 29, 2021

    Accepted: Mar. 19, 2022

    Published Online: Jul. 8, 2022

    The Author Email:

    DOI:10.3969/j.issn.1005-5630.2022.03.008

    Topics