Infrared and Laser Engineering, Volume. 51, Issue 1, 20210976(2022)
A characterization method of thin film parameters based on adaptive differential evolution algorithm (Invited)
Figures & Tables(18)
Fig. 7. Index of refractive and extinction coefficient of 104.2 nm standard sample
Fig. 8. Index of refractive and extinction coefficient of 398.4 nm standard sample
Fig. 11. Measurement of ellipsometry parameters of 104.2 nm SiO2/Si standard sample
Fig. 12. Measurement of ellipsometry parameters of 398.4 nm SiO2/Si standard sample
Table 1. System component parameter values
View tableView in ArticleTable 1. System component parameter values
Element Parameter Calibration value/(º) Polarizer P Orientation AS 45 Waveplate C1 Initial orientation c1 0 Waveplate C1 Retardation Δ1 90 Waveplate C2 Initial orientation c2 0 Waveplate C2 Retardation Δ2 90 Analyzer A Orientation PS −45
Table 2. MSE of 104.2 nm sample
View tableView in ArticleTable 2. MSE of 104.2 nm sample
Mueller element Fitting error m12 0.386 m21 0.386 m33 0.258 m34 0.232 m43 0.374 m44 0.392
Table 3. MSE of 398.4 nm sample
View tableView in ArticleTable 3. MSE of 398.4 nm sample
Mueller element Fitting error m12 0.412 m21 0.412 m33 0.365 m34 0.409 m43 0.384 m44 0.422
Table 4. Calculated value of sample thickness
View tableView in ArticleTable 4. Calculated value of sample thickness
Film thickness/nm Calculated film thickness/nm Relative error 104.2±0.4 103.8±0.6 0.38% 398.4±0.4 397.8±0.6 0.15%
Table 5. Comparison of experimental results
View tableView in ArticleTable 5. Comparison of experimental results
Film thickness /nm Algorithm Number of iterations Iteration time/s Calculated film thickness/nm Relative error 104.2 SADE 68 1.22 103.8±0.6 0.38% LM 54 1.13 104.6±0.6 0.78% 398.4 SADE 82 1.47 397.8±0.6 0.15% LM 56 1.21 401.1±0.6 0.82%
Table 6. Calculated value of sample thickness
View tableView in ArticleTable 6. Calculated value of sample thickness
Film thickness/nm Calculated film thickness/nm Relative error 104.2±0.4 104.1±0.6 0.09% 398.4±0.4 398.2±0.6 0.05%
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Yuqing Guan, Yunxia Fu, Wenzhe Zou, Zhangning Xie, Lihua Lei. A characterization method of thin film parameters based on adaptive differential evolution algorithm (Invited)[J]. Infrared and Laser Engineering, 2022, 51(1): 20210976
Paper Information
Category: Photoelectric measurement
Received: Dec. 17, 2021
Accepted: --
Published Online: Mar. 8, 2022
The Author Email: Lei Lihua (leilh@simt.com.cn)
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