Acta Photonica Sinica, Volume. 35, Issue 5, 667(2006)
Multilayers on Extreme Ultraviolet Lithography Masks and Illumination Error
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Yang Xiong, Jin Chunshui, Zhang Lichao. Multilayers on Extreme Ultraviolet Lithography Masks and Illumination Error[J]. Acta Photonica Sinica, 2006, 35(5): 667
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Received: Mar. 2, 2005
Accepted: --
Published Online: Jun. 3, 2010
The Author Email: Xiong Yang (opticsy@yahoo.com.cn)
CSTR:32186.14.