Laser & Optoelectronics Progress, Volume. 60, Issue 23, 2300004(2023)
Lithography Technical Science Knowledge Map and Multidimensional Theme Analysis
Figures & Tables(10)
Fig. 2. Trends in publications in major countries in the field of photolithography research
Table 1. Top 15 institutions with the highest number of publications in lithography research
View tableTable 1. Top 15 institutions with the highest number of publications in lithography research
No. Institution Number of papers H index Average cited times Average number of other citations Citation frequency Frequency of citation 1 Chinese Academy of Sciences 1199 41 8.21 7.37 9846 8835 2 United States Department of Energy 1103 66 20.22 18.24 22306 20121 3 IBM Company 1000 61 18.64 17.25 18638 17254 4 Belgian Interuniversity Microelectronic Center（IMEC） 755 29 7.48 6.33 5645 4780 5 ASML Company 723 34 8.79 7.50 6352 5421 6 Samsung 703 33 8.52 8.04 5993 5655 7 France Centre National de la Recherche Scientifique 691 44 17.59 16.93 12157 11700 8 Swiss Federal Institute of Technology and Research Institute Consortium 656 62 22.64 20.55 14852 13478 9 University of California，Berkeley 656 58 23.85 22.71 15648 14900 10 Osaka University 562 50 16.20 8.26 9107 4641 11 Fraunhofer Association of Germany 544 38 12.31 11.26 6697 6126 12 Intel Corporation in the United States 472 35 11.26 10.30 5317 4862 13 Massachusetts Institute of Technology 462 60 29.60 28.23 13674 13043 14 Helmholtz Federation of Germany 441 44 21.95 20.84 9682 9192 15 University of Wisconsin 408 37 17.13 15.79 6988 6444
Table 2. Major grants fund in the field of photolithography research
View tableTable 2. Major grants fund in the field of photolithography research
No. Institution Research main funding institutions（note：number in parentheses represents number of sponsored publications） 1 Chinese Academy of Sciences National Natural Science Foundation of China（592），National Key Basic Research and Development Program（139），Chinese Academy of Sciences（69），National High tech Research and Development Program of China（42），National Science and Technology Major Project of China（40） 2 United States Department of Energy Department of Energy（272），National Science Foundation（82），Semiconductor Manufacturing Technology Strategic Alliance（40），National Nuclear Safety Administration（30），Department of Defense（22） 3 IBM Company UK Office for Research and Innovation（289），UK Council for Engineering and Physical Sciences（262），European Commission（92），Irish Science Foundation（40），European Research Council（27） 4 Belgian Interuniversity Microelectronic Center（IMEC） European Commission（29），Flanders Research Foundation（17），European Leadership Electronics and Systems（12），Horizon 2020 Research and Innovation Program（10），National Science Foundation of the United States（9） 5 ASML Company ASML（20），Dutch National Organization for Scientific Research（15），German Federal Ministry of Education and Research（9），Zeiss Group（5），European Commission（5） 6 Samsung Samsung Corporation（29），National Research Foundation of Korea（26），Strategic Alliance for Conductor Manufacturing Technology（20），Ministry of Education，Science and Technology of Korea（19），Samsung Electronics Co.，Ltd.（18） 7 France Centre National de la Recherche Scientifique French National Research Agency（93），European Commission（33），Renatech Network（30），National Center for Scientific Research（12），National Science Foundation（10） 8 Swiss Federal Institute of Technology and Research Institute Consortium Swiss National Science Foundation（80），European Commission（79），European Commission Joint Research Center（21），UK Engineering and Physical Science Research Council（14），UK Office for Research and Innovation（14） 9 University of California，Berkeley Department of Energy（106），National Science Foundation（55），Semiconductor Manufacturing Technology Strategic Alliance（28），Intel Corporation（27），Department of Defense（14） 10 Osaka University Ministry of Education，Culture，Science and Technology of Japan（134），Japan Academic Revitalization Association（116），Japan KAKENHI Foundation（112），Japan New Energy Industry Technology Comprehensive Development Agency（36），Japan Science and Technology Revitalization Agency（10） 11 Fraunhofer Association of Germany German Federal Ministry of Education and Research（34），German Science Foundation（32），European Commission（25），European Commission Joint Research Center（8），China National Natural Science Foundation（8） 12 Intel Corporation in the United States Intel Corporation（46），US Department of Energy（17），National Institute of Standards and Technology（10），National Science Foundation（10），Australian Research Council（8） 13 Massachusetts Institute of Technology National Science Foundation（36），Department of Defense（23），Department of Energy（16），Defense Advanced Research Projects Agency（13），Department of Health and Human Services（13） 14 Helmholtz Federation of Germany German Science Foundation（61），European Commission（27），Karlsruhe Institute of Optics and Photonics（23），German Federal Ministry of Education and Research（20），Karlsruhe Nanofacilities（15） 15 University of Wisconsin National Science Foundation（33），Mathematical and Physical Sciences Bureau（14），Intel Corporation（12），Semiconductor Manufacturing Technology Strategic Alliance（12），Semiconductor Research Alliance（9）
Table 3. Country ranking analysis of high-level basic research talent in lithography from 2019 to 2022
View tableTable 3. Country ranking analysis of high-level basic research talent in lithography from 2019 to 2022
Country 2019 2020 2021 2022 USA 7 9 12 11 China 3 4 6 7 Singapore 1 1 1 1 Germany 1 2 2 0 UK 1 1 0 0
Table 4. Distribution of high-level basic research talents in the field of lithography by subject area
View tableTable 4. Distribution of high-level basic research talents in the field of lithography by subject area
Field 2019 2020 2021 2022 Crossing field 6 23 16 14 Physics 1 1 2 4 Materials science 2 1 1 1 Chemistry 4 3 1 0
Table 5. Thematic cluster analysis of papers in the field of photolithography research
View tableTable 5. Thematic cluster analysis of papers in the field of photolithography research
Cluster Theme induction High-frequency keywords Representative research institutions 1 Thin film preparation and deposition Fabrication，films，silicon，nanostructures，arrays，
nanofabrication，thin-films，surface，deposition，growth
Chinese Academy of Sciences（386），U.S. Department of Energy（216），French National Center for Scientific Research（213），Swiss Federal Institute of Technology and Research Institute Consortium（179），IBM（132） 2 Light source，lens，microscope，microstructure，microfabrication Photolithography，microscopy，microstructures，microfabrication，mems，light，laser，lens，system，diffraction Chinese Academy of Sciences（330），U.S. Department of Energy（164），Swiss Federal Institute of Technology and Research Institute Consortium（124），Russian Academy of Sciences（122），German Fraunhofer Association（117） 3 Optical lithography and mask Lithography，mask，simulation，design，EUV，exposure，optical lithography，OPC，photomask，lithography simulation，ARF Swiss Federal Institute of Technology and Research Consortium（362），US Department of Energy（351），Dutch ASML（325），Samsung（301），IBM（295） 4 Photoresist and electron beam lithography Resist，resolution，photoresist，electron-beam lithography，polymers，resists，chemically amplified resist，line edge roughness，chemically amplified resists，electron-beam IBM（342），Osaka University（341），US Department of Energy（178），Belgian Microelectronics Research Center（170），Swiss Federal Institute of Technology and Research Consortium（168） 5 Extreme ultraviolet lithography EUV lithography，extreme ultraviolet，extreme ultraviolet lithography，optics，generation，scattering，interference lithography，contamination，radiation，plasma US Department of Energy（383），Osaka University（227），ASML Netherlands（182），University of California，Berkeley（169），Belgian Microelectronics Research Center（155） 6 Nanoimprint lithography Nanoimprint lithography，imprint lithography，nanoimprint，pattern transfer，step，template，block-copolymers，mold，thin polymer-films，directed self-assembly French National Center for Scientific Research（86），French Atomic Energy Commission（58），University of Texas at Austin（55），University of Grenoble Alps（51），University of Osaka（50）
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Bing Li, Yao Che, Hui Xu, Zhigang Zhang, Hong Zhou. Lithography Technical Science Knowledge Map and Multidimensional Theme Analysis[J]. Laser & Optoelectronics Progress, 2023, 60(23): 2300004
Paper Information
Category: Reviews
Received: Jun. 19, 2023
Accepted: Sep. 6, 2023
Published Online: Dec. 4, 2023
The Author Email: Zhou Hong (zhouh@mail.whlib.ac.cn)
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