Based on earlier reports in the lithography technology field and global list of "highly-cited scientists", the research time and distribution characteristics of countries, research institutions, research funding institutions, and high-level basic research talents in the lithography technology are analyzed. Based on these two aspects, a bibliometric analysis of published works in the lithography technology field was performed to investigate the research direction, themes, and development trends in this field. The results show that the output of lithography technology papers is currently declining, and the United States has a leading edge in this research field. Research on optical lithography and masking, photoresist and electron beam lithography, extreme ultraviolet (EUV) lithography, and other technical topics is still dominated by foreign institutions. China has launched research on emerging themes, including high-numerical-aperture EUV lithography, guided self-assembly lithography, graphene-based materials, and machine learning applications. This study proposes suggestions for improving the overall layout, involved research institutions, enterprise strength, and talent mechanism of lithography technology research and development to provide a scientific basis for decision-making and research directions in related fields.