Acta Photonica Sinica, Volume. 50, Issue 5, 86(2021)

Critical Coupling Condition and Preparation Technology of Aluminum Nitride Microring Resonator

Yishuai HAN1...2, Tianyu SUN2, Huimin JIA1, Jilong TANG1, Dan FANG1, Dengkui WANG1, Xiaohua WANG1, Baoshun ZHANG2 and Zhipeng WEI1 |Show fewer author(s)
Author Affiliations
  • 1State Key Laboratory of High Power Semiconductor Laser, College of Science, Changchun University of Science and Technology, Changchun30022, China
  • 2Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou, Jiangsu1513, China
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    Figures & Tables(10)
    Microring characteristics map
    Relationship between coupling strength and phase mismatch
    Bend-coupled microring resonator
    XRD test chart of AlN single crystal film
    Flow chart of preparation of microring structure
    Pattern distortion caused by electron beam lithography of insulating substrate material
    The effect of electron beam lithography in the coupling area of two conductive layers
    SEM image of four groups of etching results with different parameters
    SEM image of bending coupling microring
    • Table 1. Etching parameters of AlN

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      Table 1. Etching parameters of AlN

      GroupVacuumPBPRFFux(Cl2)Flux(BCl3)Time
      # 15 mT200 W650 W60 sccm30 sccm70 s
      # 25 mT200 W500 W60 sccm30 sccm60 s
      # 35 mT200 W500 W60 sccm10 sccm60 s
      # 45 mT200 W500 W60 sccm10 sccm50 s
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    Yishuai HAN, Tianyu SUN, Huimin JIA, Jilong TANG, Dan FANG, Dengkui WANG, Xiaohua WANG, Baoshun ZHANG, Zhipeng WEI. Critical Coupling Condition and Preparation Technology of Aluminum Nitride Microring Resonator[J]. Acta Photonica Sinica, 2021, 50(5): 86

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    Paper Information

    Category: Lasers and Laser Optics

    Received: Nov. 23, 2020

    Accepted: Jan. 5, 2021

    Published Online: Jun. 22, 2021

    The Author Email:

    DOI:10.3788/gzxb20215005.0514003

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