Acta Photonica Sinica, Volume. 50, Issue 5, 86(2021)
Critical Coupling Condition and Preparation Technology of Aluminum Nitride Microring Resonator
Fig. 6. Pattern distortion caused by electron beam lithography of insulating substrate material
Fig. 7. The effect of electron beam lithography in the coupling area of two conductive layers
Fig. 8. SEM image of four groups of etching results with different parameters
|
Get Citation
Copy Citation Text
Yishuai HAN, Tianyu SUN, Huimin JIA, Jilong TANG, Dan FANG, Dengkui WANG, Xiaohua WANG, Baoshun ZHANG, Zhipeng WEI. Critical Coupling Condition and Preparation Technology of Aluminum Nitride Microring Resonator[J]. Acta Photonica Sinica, 2021, 50(5): 86
Category: Lasers and Laser Optics
Received: Nov. 23, 2020
Accepted: Jan. 5, 2021
Published Online: Jun. 22, 2021
The Author Email: