[1] [1] Adb E I, Rehim S S, Sayyah S M, et al. Applied Surface Science, 2000, 165(4): 249.

[2] [2] Moffat T P, Wheeler D, Josell D. J. Electrochem. Soc., 2004, 151(4): C262.

[3] [3] Zhang M, Willey M, West A C. Electrochem. Solid-State Lett., 2005, 8(10): C151.

[4] [4] Wilkes J S. Green. Chem., 2002, 4(2): 73.

[5] [5] Yang M H, Sun I W. J. Appl. Electrochem., 2003, 33(11): 1077.

[6] [6] Endres F. Phys. Chem. Chem. Phys., 2001, 3(15): 3165.

[7] [7] Chen P Y, Sun I W. Electrochim. Acta, 2001, 46(8): 1169.

[8] [8] Mukhopadhyay I, Freyland W. Langmuir, 2003, 19(6): 1951.

[9] [9] Shin J H, Henderson W A, Passerini S. Electorchem. Commun., 2003, 5(12): 1016.

[10] [10] Fung Y S, Zhu D R. J. Electrochem. Soc., 2002, 149(3): A319.

[11] [11] Dzyuba S V, Bartsch R A. Angew. Chem. Int. Ed., 2003, 42(2): 148.

[12] [12] Zhao D B, Wu M, Kou Y, et al. Catalysis Today, 2002, 74(1): 157.

[13] [13] Wasserscheid P, Keim W. Angew. Chem. Int. Ed., 2000, 39(21): 3772.

[14] [14] Endres F. Chem. Phys. Chem., 2002, 3(2): 144.

[15] [15] El Abedin S Z, Borissenko N, Endres F. Electrochem. Commun., 2004, 6(5): 510.

[16] [16] Abbott A P, McKenzie K J. Phys. Chem. Chem. Phys., 2006, 8(37): 4265.

[17] [17] Huang L, Yang F Z, Xu S K, et al. Transactions of Institute of Metal Finishing, 2001, 79(4): 136.

[18] [18] Biswas N, Umapathy S. J. Phys. Chem. A, 2000, 104(12): 2734.

[20] [20] Yu H Z, Zhang J, Zhang H L, et al. Langmuir, 1999, 15(1): 16.