[1] [1] FLORY F. Comparison of different technologies for high quality optical coatings ［J］. SPIE, 1990, 1270: 172-183.

[2] [2] HERRMANN JR W C. E-beam deposition characteristics of reactively evaporated Ta2O5 for optical interference coatings ［J］. Journal of Vacuum Science and Technology, 1981, 18(3): 1303-1305.

[3] [3] SCHILLER S, HEISIG U, STEINFELDER K, et al.. Reactive DC sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide films ［J］.Thin Solid Films, 1979, 63(2): 369-375.

[4] [4] MARTIN P J, MACLEOD H A, NETTERFIELD R P, et al.. Ion-beam-assisted deposition of thin films ［J］. Applied Optics, 1983, 22(1): 178-184.

[5] [5] DEMIRYONT H, SITES J R, GEIB K. Effects of oxygen content on the optical properties of tantalum oxide films deposited by ion-beam sputtering ［J］.Applied Optics, 1985, 24(4):490-495.

[6] [6] YOON S G, KIM Y T, KIM H K, et al.. Comparison of residual stress and optical properties in Ta2O5 thin films deposited by single and dual ion beam sputtering ［J］. Materials Science and Engineering: B, 2005, 118(1-3): 234-237.

[7] [7] YOON S G, KIM H K, KIM M J, et al.. Effect of substrate temperature on surface roughness and optical properties of Ta2O5 using ion-beam sputtering ［J］. Thin Solid Films, 2005, 475(1): 239-242.

[8] [8] HUANG A P, CHU P K. Characteristics of interface between Ta2O5 thin film and Si (100) substrate ［J］. Surface and Coatings Technology, 2005, 200(5-6): 1714-1718.

[9] [9] CHENG W H, CHI S F, CHU A K. Effect of thermal stresses on temperature dependence of refractive index for Ta2O5 dielectric films ［J］. Thin Solid Films, 1999, 347(1-2): 233-237.

[10] [10] LIU W J, CHIEN C H. Influences of residual argon gas and thermal annealing on Ta2O5 thin films ［J］. Japanese Journal of Applied Physics, 2005, 44(1R): 181.

[11] [11] UTHANNA S, CHANDRA S V J, REDDY P S, et al.. Effect of post-deposition annealing on the structural, electrical, and optical properties of DC magnetron sputtered Ta2O5 films［J］. J. Phys.: Conf. Ser., 2008, 114(1):012035.

[12] [12] Handbook of Mathematics ［M］. Beijing: Higher Education Press, 1979: 853-858.(in Chinese)

[13] [13] FERLAUTO A S, FERREIRA G M, PEARCE J M, et al.. Analytical model for the optical functions of amorphous semiconductors from the near infrared to ultraviolet: Applications in thin film photovoltaics ［J］. Journal of Applied Physics, 2002, 92(5): 2424-2436.

[14] [14] LIU H S, JI Y Q, ZHANG F, et al.. Dispersive properties of optical constants of some metallic oxide thin films in the mid-infrared regions ［J］. Acta Optica Sinica, 2014, 34(8): 0831003.(in Chinese)

[15] [15] HE SH H, WEN ZH Q, LOU T. Experiment and Data Handle ［M］. Changsha: National University of Defence Technology Press, 2002: 62-92.(in Chinese)