Opto-Electronic Engineering, Volume. 37, Issue 2, 32(2010)
Simulation on Exposure Process of SU8 Thick Photoresist Based on Dill’s Model
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LIU Ren, ZHENG Jin-jin, SHEN Lian-guan, TIAN Yang-chao, LIU Gang, ZHOU Hong-jun. Simulation on Exposure Process of SU8 Thick Photoresist Based on Dill’s Model[J]. Opto-Electronic Engineering, 2010, 37(2): 32
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Received: Jun. 20, 2009
Accepted: --
Published Online: May. 28, 2010
The Author Email: Ren LIU (liurend@mail.ustc.edu.cn)