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Opto-Electronic Engineering, Volume. 37, Issue 2, 32(2010)

Simulation on Exposure Process of SU8 Thick Photoresist Based on Dill’s Model

LIU Ren1,*... ZHENG Jin-jin1, SHEN Lian-guan1, TIAN Yang-chao2, LIU Gang2 and ZHOU Hong-jun2 |Show fewer author(s)
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    LIU Ren, ZHENG Jin-jin, SHEN Lian-guan, TIAN Yang-chao, LIU Gang, ZHOU Hong-jun. Simulation on Exposure Process of SU8 Thick Photoresist Based on Dill’s Model[J]. Opto-Electronic Engineering, 2010, 37(2): 32

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    Received: Jun. 20, 2009

    Accepted: --

    Published Online: May. 28, 2010

    The Author Email: Ren LIU (liurend@mail.ustc.edu.cn)

    DOI:10.3969/j.issn.1003-501x.2010.02.006

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology