Optics and Precision Engineering, Volume. 16, Issue 8, 1354(2008)

Dynamic exposure model of laser direct writing in Cartesian coordinate

ZHANG Shan*... TAN Jiu-bin, WANG Lei and JIN Zhan-lei |Show fewer author(s)
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    References(6)

    [1] [1] DILL D H,HOMBERGER W P,HAUGE P S,et al..Characterization of positive photoresist[J].IEEE Trans.Electron Devices,1975,22(7):445-452

    [2] [2] MACK C A.30 Years of lithography simulation[J].SPIE,2004.5754(1):1-12

    [3] [3] YANG G G,SHENG Y B.Research on laser direct writing system and its lithography properties[J].SPIE,1998,3550:409-418

    [4] [4] SALGUEIRO J R,MORENO V,LINARES J.Model of linewidth for laser writing on a photoresist[J].Appl.Opt.,2002,41(5):895-901

    [7] [7] SONKA M,HLAVAC V,BOYLE R.Image Processing,Analysis,and Machine Vision[M].Posts & Telecom Press,2003:12-14

    [8] [8] DILL F H,NEUREUTHER A R,TUTTLE J A,et al..Modeling projection printing of positive photoresist[J].IEEE Trans.Electron Devices,1975,22(7):456-463

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    ZHANG Shan, TAN Jiu-bin, WANG Lei, JIN Zhan-lei. Dynamic exposure model of laser direct writing in Cartesian coordinate[J]. Optics and Precision Engineering, 2008, 16(8): 1354

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    Paper Information

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    Received: Jan. 7, 2008

    Accepted: --

    Published Online: Feb. 28, 2010

    The Author Email: Shan ZHANG (zhangshan212@gmail.com)

    DOI:

    CSTR:32186.14.

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