Acta Photonica Sinica, Volume. 31, Issue 3, 308(2002)
THE X-RAY DIFFRACTION STUDY ON THE INTERFACE OF AlGaAs BUFFER LAYER AND GaAs ACTIVE LAYER OF THE TRANSPARENT GaAs PHOTOCATHODE
[1] [1] Fewster P F.High-resolution diffraction-space mapping and topography.Appl Phys,1994,A58(1):121~127
[2] [2] Fewster P F,Measurement of interface roughness in a superlattice of delta-barriers of Al in GaAs using high-resolution X-ray diffractometry.J Phys D:Appl Phys,1995,28A(1):154~158
[3] [3] Fewster P F.X-ray diffraction from low dimensional structures.Semicond Sci Technol,1993,8(10):1926~1929
[4] [4] van der Sluis P.Determination of strain in epitaxial semiconductor structures by high-resolution X-ray diffraction.Appl Phys,1994,A58(1):129~134
Get Citation
Copy Citation Text
[in Chinese], [in Chinese], [in Chinese], [in Chinese]. THE X-RAY DIFFRACTION STUDY ON THE INTERFACE OF AlGaAs BUFFER LAYER AND GaAs ACTIVE LAYER OF THE TRANSPARENT GaAs PHOTOCATHODE[J]. Acta Photonica Sinica, 2002, 31(3): 308