Acta Photonica Sinica, Volume. 31, Issue 3, 308(2002)

THE X-RAY DIFFRACTION STUDY ON THE INTERFACE OF AlGaAs BUFFER LAYER AND GaAs ACTIVE LAYER OF THE TRANSPARENT GaAs PHOTOCATHODE

[in Chinese], [in Chinese], [in Chinese], and [in Chinese]
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    References(4)

    [1] [1] Fewster P F.High-resolution diffraction-space mapping and topography.Appl Phys,1994,A58(1):121~127

    [2] [2] Fewster P F,Measurement of interface roughness in a superlattice of delta-barriers of Al in GaAs using high-resolution X-ray diffractometry.J Phys D:Appl Phys,1995,28A(1):154~158

    [3] [3] Fewster P F.X-ray diffraction from low dimensional structures.Semicond Sci Technol,1993,8(10):1926~1929

    [4] [4] van der Sluis P.Determination of strain in epitaxial semiconductor structures by high-resolution X-ray diffraction.Appl Phys,1994,A58(1):129~134

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese]. THE X-RAY DIFFRACTION STUDY ON THE INTERFACE OF AlGaAs BUFFER LAYER AND GaAs ACTIVE LAYER OF THE TRANSPARENT GaAs PHOTOCATHODE[J]. Acta Photonica Sinica, 2002, 31(3): 308

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    Paper Information

    Category: Optoelectronics

    Received: Jul. 5, 2001

    Accepted: --

    Published Online: Sep. 18, 2007

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