On the basis of Arrhenius theory and molecular vibration theory, the elastic and hyper elastic contact among the soft polishing particles, fused glass and the polishing pad was analyzed, then the material removal mechanism of fused glass using soft particles in polishing process was explored. According to the theoretical research mentioned above, a lots of polishing experiments were carried out and a material removal rate model was established. Theoretical calculation and experimental results show that the material is mainly removed by the interfacial tribo-chemical effect between polishing particles and fused glass in chemical mechanical polishing. The depth of a single particle embedding into the fused glass is 0.05 nm and the material removed by a single particle is a molecular scale. The superficial molecules of fused glass are easier to gain enough energy to implement chemical reactions, so that the materials could be removed easily. Moreover, the polishing pressure, the chemical reagents in polishing liquid, and the relative movement speed between the fused glass and the pad determine the material removal rate of fused glass.