Laser & Optoelectronics Progress, Volume. 56, Issue 3, 031601(2019)
Preparation and Characteristics of Middle and Far Infrared Stealth of Photonic Crystal Film under Intense Irradiation
[1] Zhang J Q, Fang X P[M]. Infrared physics, 115-124(2007).
[12] Fink Y, Winn J N, Fan S et al. A dielectric omnidirectional reflector[J]. Science, 282, 1679-1682(1998).
[14] Ye Y T, Liu S[M]. Infrared and low light level technology, 48-58(2010).
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Ruihuang Liu, Jiaming Shi, Dapeng Zhao, Jikui Zhang, Zhiwei Liu. Preparation and Characteristics of Middle and Far Infrared Stealth of Photonic Crystal Film under Intense Irradiation[J]. Laser & Optoelectronics Progress, 2019, 56(3): 031601
Category: Materials
Received: Aug. 2, 2018
Accepted: Aug. 31, 2018
Published Online: Jul. 31, 2019
The Author Email: Shi Jiaming (sjmeei@yahoo.com.cn)