Chinese Optics Letters, Volume. 13, Issue Suppl., S23102(2015)

Fatigue effect of hafnia/silica high-reflective coatings under multiple laser pulses at 1064  nm

Yanyan Cui1,2, Hongji Qi1、*, Hu Wang1,2, Bin Wang1,2, Wenwen Liu1,2, Chaoyang Wei1, Jialu Guo1,2, and Kui Yi1
Author Affiliations
  • 1Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
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    References(16)

    [2] O. N. Bosyi, O. M. Efimov. Kvantovaya Elektronika, 23, 737(1996).

    [3] O. N. Bosyi, O. M. Efimov. Kvantovaya Elektronika, 23, 729(1996).

    [4] Z. Yu, H. He, X. Li, H. Qi, W. Liu. Chin. Opt. Lett., 073101(2013).

    [11] G. J. Exarhos, H. Krol, C. Amra, C. Grèzes-Besset, M. Commandré, A. H. Guenther, K. L. Lewis, D. Ristau, M. J. Soileau, C. J. Stolz. Proc. SPIE, 6720, 67200V(2007).

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    Yanyan Cui, Hongji Qi, Hu Wang, Bin Wang, Wenwen Liu, Chaoyang Wei, Jialu Guo, Kui Yi. Fatigue effect of hafnia/silica high-reflective coatings under multiple laser pulses at 1064  nm[J]. Chinese Optics Letters, 2015, 13(Suppl.): S23102

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    Paper Information

    Category: Thin films

    Received: Mar. 30, 2015

    Accepted: May. 10, 2015

    Published Online: Aug. 8, 2018

    The Author Email: Hongji Qi (qhj@siom.ac.cn)

    DOI:10.3788/COL201513.S23102

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