Laser & Optoelectronics Progress, Volume. 54, Issue 8, 82201(2017)
Design and Analysis of Illumination System of Talbot Self-Imaging Lithographic Equipment
[1] [1] Solak H H, Dais C, Clube F. Displacement Talbot lithography: A new method for high-resolution patterning of large areas[J]. Optics Express, 2011, 19(11): 10686-10691.
[2] [2] Solak H H, Ekinci Y. Achromatic spatial frequency multiplication: A method for production of nanometer-scale periodic structures[J]. Journal of Vacuum Science & Technology B, 2005, 23(6): 2705-2710.
[3] [3] Zhang Baohao, Zhou Sumei, Yang Xiaoming, et al. Talbot effect of square-aperture microlens array[J]. Acta Optica Sinica, 2016, 36(5): 0523001.
[4] [4] Si Xinchun, Tong Junmin, Tang Yan, et al. Lithography alignment technology based on two-dimensional Ronchi grating[J]. Chinese J Lasers, 2015, 42(9): 0910001.
[5] [5] Talbot H F. Facts relating to optical science No. IV[J]. Philosophical Magazine, 1836, 9(56): 401-407.
[6] [6] Yu Daoyin, Tan Hengying. Optical engineering[M]. 2nd ed. Beijing: China Machine Press, 2006.
[7] [7] Zhao Yang. Design of complex illumination optical system for deep ultraviolet lithography[D]. Changchun: Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2010: 21-22.
[8] [8] Welford W T, Winston R. The optics of nonimaging concentrators: Light and solar energy[J]. Physics Today, 1980, 33(6): 56-57.
[11] [11] Ries H, Muschaweck J. Tailored freeform optical surfaces[J]. Journal of The Optical Society of America A, 2002,19(3): 590-595.
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Tong Junmin, Liu Junbo, Hu Song. Design and Analysis of Illumination System of Talbot Self-Imaging Lithographic Equipment[J]. Laser & Optoelectronics Progress, 2017, 54(8): 82201
Category: Optical Design and Fabrication
Received: Mar. 16, 2017
Accepted: --
Published Online: Aug. 2, 2017
The Author Email: Junmin Tong (tjmtx@126.com)