Laser & Optoelectronics Progress, Volume. 54, Issue 8, 82201(2017)
Design and Analysis of Illumination System of Talbot Self-Imaging Lithographic Equipment
Based on optical design theory of imaging illumination and non-imaging optical theory, an initial optical structure of illumination system is established according to the special requirements of Talbot self-imaging lithographic equipment. The optical design software Zemax is applied to optimize the initial structure. The software Lighttools is used to set up models and perform large-scale ray tracing. The simulation result shows that the nonuniformity of illumination approaches 1.83% in the illumination area of 60 mm×60 mm. Meanwhile, the power density is no less than 1.15 mW·mm-2. The tolerance analysis is carried out on the illumination system. The results show that the illumination system satisfies the demand of Talbot self-imaging lithography.
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Tong Junmin, Liu Junbo, Hu Song. Design and Analysis of Illumination System of Talbot Self-Imaging Lithographic Equipment[J]. Laser & Optoelectronics Progress, 2017, 54(8): 82201
Category: Optical Design and Fabrication
Received: Mar. 16, 2017
Accepted: --
Published Online: Aug. 2, 2017
The Author Email: Junmin Tong (tjmtx@126.com)