[1] [1] Park H D, Dhali S K. Appl. Phys. Letters, 2000, 77(14): 2112.

[2] [2] Han S Uhm, Eun H CHoi, Y Lim. Appl. Phys. Letters, 2002, 80(5): 737.

[3] [3] Masaki Kuzumoto, Shuji Ogawa, Masaki Tanaka, et al. IEEE Journal of Quantum Electronics, 1990, 26(6): 1130.

[4] [4] Joosung Kim, Dongjin Byun, Jin-sang Kim, et al. Journal of Crystal Growth, 2000, 2(10): 478.

[5] [5] Nicolas Gherarid, Steve Martin, Francoise Massines. J. Phys. D: Appl. Phys., 2000, 33(19): L104.

[6] [6] Vidmar R J. IEEE Trans. On Plasma Sci., 1990, 18(4): 733.

[7] [7] Stefanovic I, Bibinov N K, Deryugin A A, et al. Plasma Sources Sci. Technol., 2001, 10(3): 406.

[8] [8] Laroussi M, Alexeff I, Kang W L. IEEE Trams. Plasma Sci., 2000, 28(1): 184.

[9] [9] Roth J R. Phys. Rev. E, 1997, 55(6): 6731.

[10] [10] Hong Y C, Kang S, Hong Y B, et al. Phys. Plasmas, 2009, 16: 123502.

[11] [11] Li X C, Yuan N, Jia P Y, et al. Chem, Phys. Plasmas, 2010, 17: 093540.

[12] [12] Choi J H, Lee T I, Han I, et al. Plasma Sources Sci., Technol., 2006, 15: 416.