Acta Optica Sinica, Volume. 30, Issue s1, 100103(2010)

Preparation and Photoemission Performance of Transmission-Mode GaN Ultraviolet Photocathode

Du Xiaoqing1、*, Chang Benkang2, Qian Yunsheng2, Gao Pin2, Tian Jian1, and Wang Xiaohui2
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  • 1[in Chinese]
  • 2[in Chinese]
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    As the photocathode practical application mode, transmission-type structure has important signitication for the research. A MOCVD epitaxial p-type GaN, which has sapphire substrate and AlN buffer layer, was designed as transmission-type material. This material was prepared into GaN photocathode by ultra-high vacuum surface cleaning technique and (Cs,O) activation technique. The UV spectral response of prepared GaN photocathode was measured. The testing results showed that the photocathode had obvious gate-shaped response in the transmission mode, and the maximum quantum efficiency was close to 15%. Comparing to the reflection-mode spectral response curve, the overall responses of transmission-mode were lower and long-wave response threshold moved towards shortwave. The experiment results were analyzed from photocathode material structure, epitaxial level and photocathode preparation techniques.

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    Du Xiaoqing, Chang Benkang, Qian Yunsheng, Gao Pin, Tian Jian, Wang Xiaohui. Preparation and Photoemission Performance of Transmission-Mode GaN Ultraviolet Photocathode[J]. Acta Optica Sinica, 2010, 30(s1): 100103

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    Paper Information

    Category: Materials

    Received: Jun. 30, 2010

    Accepted: --

    Published Online: Dec. 8, 2010

    The Author Email: Xiaoqing Du (duxq@cqu.edu.cn)

    DOI:10.3788/aos201030.s100103

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