Optics and Precision Engineering, Volume. 24, Issue 4, 690(2016)

Phase-modulated ellipsometry combined photo-elastic modulation with electro-optic modulation

LI Ke-wu1...2,3,*, WANG Li-ming1, WANG Zhi-bin1,2,3, ZHANG Rui1,2,3, XUE Rui2, and CHEN You-hua1,23 |Show fewer author(s)
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    References(16)

    [1] [1] LIAO Y B. Polarization Optics[M].Beijing: Science Press, 2003.(in Chinese)

    [2] [2] POSTAVA K, MAZIEWSKI A, YAMAGUCHI T, et al.. Null ellipsometer with phase modulation[J]. Optics Express, 2004, 12(24): 6040-6045.

    [3] [3] ZHU J L, LIU S Y, JIANG H, et al.. Improved deep-etched multilayer grating reconstruction by considering etching anisotropy and abnormal errors in optical scatterometry[J]. Optics Letters, 2015, 40(4): 471-474.

    [4] [4] ARTEAGA O, FREUDENTHAL J, WANG B L, et al.. Mullermatrix polarimetry with four photaoelastic modilators: theroy and calibration[J]. Applied Optics, 2012, 51(28): 6805-6816.

    [5] [5] TAKESHI N, MASANORI H. Measurement of complex optical constants of highly doped Si wafer using terahertz ellipsometry[J]. Applied Physics Letters, 2001, 79(24): 3917-3919.

    [6] [6] DRUDE P.Ueber die Gesetze der Reflexion und Brechung des lichtes an der Grenze absorbirender Krystalle[J]. Annalen der Physik, 1887, 268(12): 584-625.(in Germany)

    [7] [7] LI K W, WANG ZH B, CHEN Y H, et al..High sensitive measurement of optica rotation based on photo-elastic modualtion [J]. Acta Phys. Sin., 2015, 64(18): 184206.(in Chinese)

    [8] [8] ZENG A J, LI F Y, ZHU L L, et al.. Simultaneous measurement of retardance and fast axis angle of a quarter-wave plate using one photoelastic modulator[J]. Applied Optics, 2011, 50(22): 4347-4352.

    [9] [9] JASPERSON S N, SCHNATTERLY S E. An improved method for high reflectivity ellipsometry based on a new polarization modulation technique[J]. Review of Scientific Instruments, 1969, 40(6): 761-767.

    [10] [10] CAUREL E G, MARTINOA D, LI Y, et al.. Application of spectroscopic ellipsometry and Muller ellipsometry to optical characterization[J]. Applied Spectroscopy, 2013, 67(1): 1-21.

    [11] [11] JELLISON G E, MODINE F A.Two-modulator generalized ellipsometry: theory[J]. Applied Optics, 1997, 36(31): 8190-8197.

    [13] [13] De MARTINO A, GARCIA-CAUREL E, LAUDE B, et al..General methods for optimized design and calibration Muller polarimeters[J]. Thin Solid Films, 2004, 455: 112-119.

    [14] [14] LI C. Stepped polarization states: Representation and its applications to optical sensing and measurement[J]. Optics Communications, 2008, 281(8): 2033-2039.

    [15] [15] WANG M W, CHAO Y F, LEOU K C, et al.. Calibration of phase modulation amplitude of photoelastic modulator[J]. Japanese Journal of Applied Physics, 2004, 43(2): 827-832.

    [16] [16] FUJIWARA H. Spectroscopic Ellipsometry: Principles and Application [M].New York: John Wiley & Sons Ltd., 2007: 147-148.

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    LI Ke-wu, WANG Li-ming, WANG Zhi-bin, ZHANG Rui, XUE Rui, CHEN You-hua. Phase-modulated ellipsometry combined photo-elastic modulation with electro-optic modulation[J]. Optics and Precision Engineering, 2016, 24(4): 690

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    Paper Information

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    Received: Nov. 13, 2015

    Accepted: --

    Published Online: Jun. 6, 2016

    The Author Email: Ke-wu LI (kewuli1990@gmail.com)

    DOI:10.3788/ope.20162404.0690

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