Acta Photonica Sinica, Volume. 50, Issue 10, 1024002(2021)

Progress in Wafer-level Metasurface-based Flat Optics(Invited)

Yuan DONG*... Qize ZHONG, Yongjian ZHENG, Shaonan ZHENG, Ting HU and Yuandong GU |Show fewer author(s)
Author Affiliations
  • School of Microelectronics,Shanghai University,Shanghai 200444,China
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    Figures & Tables(12)
    Metasurface-based color display on a fabricated 12-inch Si wafer[38]. Adapted with permission from Ref.[38]© The Optical Society
    Metasurface-based polarizing bandpass filter on a fabricated 12-inch Si wafer[39]. Adapted with permission from Ref.[39]© The Optical Society
    Metasurface-based half-wave plate on a fabricated 12-inch Si wafer[40]. Adapted from Ref.[40],© 2019 Zhengji Xu et al.,published by De Gruyter. Under the Creative Commons Attribution 4.0 Public License
    Metalens fabricated on a 4-inch Si wafer[41]. Adapted with permission from Ref.[41]© The Optical Society
    Metalens fabricated on a 12-inch Si wafer[42]. © 2019 IEEE. Reprinted with permission from Ref.[42]
    Plasmonic perfect absorber fabricated on an 8-inch Si wafer[44]. Adapted from Ref.[44]. Under the Creative Commons Attribution 4.0 Public License
    Reflective[45] and transmissive[46] metalenses fabricated on quartz wafers. Adapted with permission from Refs.[45-46]© The Optical Society
    Transmissive metalenses fabricated in all quartz glass wafers. Adapted with permission from Ref.[47]© 2019 American Chemical Society
    Metalenses directly fabricated on a 12-inch glass wafer[48-49]. Adapted from Refs.[48-49]
    Metalens fabricated on a 12-inch glass wafer by layer transfer technology[50]. Adapted from Ref.[50],© 2020 Ting Hu et al.,published by De Gruyter. Under the Creative Commons Attribution 4.0 Public License
    Metasurface deflector fabricated on a 12-inch glass wafer by layer transfer technology[51]. Adapted from Ref.[51],© 2020 Nanxi Li et al.,published by De Gruyter. Under the Creative Commons Attribution 4.0 Public License
    • Table 1. Summary on wafer level metasurface based flat optics38-56

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      Table 1. Summary on wafer level metasurface based flat optics38-56

      Wafer

      Mat.a

      Wafer

      size/inch

      Device

      type

      Characterization

      wavelength

      MS

      Mat.

      MS

      cladding

      Mat.

      MS min.

      CD/nm

      MS

      height/nm

      Lithography

      tool

      Fabrication

      approach

      Ref.
      Si2

      Perfect

      absorbers

      Mid-IR

      (10.0~18.7 µm)

      AuAir>1 00030UV mask aligner

      Direct

      patterning

      43
      Si8

      Perfect

      absorbers

      Mid-IR

      (3~10 µm)

      AuAir~570b50I-line stepper

      Direct

      patterning

      44
      Si12Color display

      Visible

      (0.4~0.8 µm)

      a-SiAir65b130

      193 nm DUV

      immersion scanner

      Direct

      patterning

      38
      Si12Metalens

      Near-IR

      (1.55 µm)

      a-SiAir100850

      193 nm DUV

      immersion scanner

      Direct

      patterning

      42
      Si12

      Polarizing

      bandpass filter

      Near IR

      (1.1~2.5 µm)

      SiAir~170b~750b

      193 nm DUV

      immersion scanner

      Direct

      patterning

      39
      Si12

      Half-wave

      plate

      Near IR

      (1.1~2.5 µm)

      SiAir~200b~1 700b

      193 nm DUV

      immersion scanner

      Direct

      patterning

      40
      Si or SiO2 glass4Metalens

      Near-IR(1.55 µm)

      or Visible(0.633 µm)

      SiNAir5002 000I-line stepper

      Direct

      patterning

      41
      SiO2 glass4Metalens

      Near-IR

      (1.55 µm)

      a-SiAir830600I-line stepper

      Direct

      patterning

      46
      SiO2 glass4Metalens

      Visible

      (0.633 µm)

      SiO2Air2502 000

      248 nm DUV

      stepper

      Direct

      patterning

      47
      SiO2 glass6Metalens

      Mid-IR

      (4.6 µm)

      AuAir80050I-line stepper

      Direct

      patterning

      45
      SiO2 glass12

      Subtractive

      color filter

      Visible

      (0.4~0.8 µm)

      a-SiGlue130b400b

      193 nm DUV

      immersion scanner

      Layer

      transfer

      53
      SiO2 glass12

      Beam

      deflector

      Near-IR

      (0.94 µm)

      a-SiGlue221125b

      193 nm DUV

      immersion scanner

      Layer

      transfer

      51
      SiO2 glass12Metalens

      Near-IR

      (0.94 µm)

      a-SiAirN.A.400

      193 nm DUV

      immersion scanner

      Direct

      patterning

      54
      SiO2 glass12

      Subtractive

      color filter

      Visible

      (0.4~0.8 µm)

      a-SiAir240b400b

      193 nm DUV

      immersion scanner

      Direct

      patterning

      55
      SiO2 glass12Metalens

      Near-IR

      (0.94 µm)

      a-SiGlue100600

      193 nm DUV

      immersion scanner

      Layer

      transfer

      50
      SiO2 glass12Metalens

      Near-IR

      (0.94 µm)

      a-SiAir100400

      193 nm DUV

      immersion scanner

      Direct

      patterning

      48
      SiO2 glass12Metalens

      Near-IR

      (0.94 µm)

      a-SiAirN. A.400

      193 nm DUV

      immersion scanner

      Direct

      patterning

      49
      SiO2 glass12

      Beam

      deflector

      Near-IR

      (0.94 µm)

      a-SiAir100400

      193 nm DUV

      immersion scanner

      Direct

      patterning

      56
      SiO2 glass12

      Subtractive

      color filter

      Visible

      (0.4~0.8 µm)

      a-SiGlue105b110,170,230b

      193 nm DUV

      immersion scanner

      Layer

      transfer

      52
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    Yuan DONG, Qize ZHONG, Yongjian ZHENG, Shaonan ZHENG, Ting HU, Yuandong GU. Progress in Wafer-level Metasurface-based Flat Optics(Invited)[J]. Acta Photonica Sinica, 2021, 50(10): 1024002

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    Paper Information

    Category: Optics at Surfaces

    Received: Jul. 30, 2021

    Accepted: Aug. 30, 2021

    Published Online: Nov. 3, 2021

    The Author Email: DONG Yuan (dongyuan@shu.edu.cn)

    DOI:10.3788/gzxb20215010.1024002

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