Acta Optica Sinica, Volume. 43, Issue 8, 0822003(2023)

Progress in CMOS-Compatible Fabrication Process of Dielectric Metasurfaces

Chi Zhang and Shumin Xiao*
Author Affiliations
  • School of Materials Science and Engineering, Harbin Institute of Technology (Shenzhen), Shenzhen 518055, Guangdong , China
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    Figures & Tables(11)
    All-Si metasurface polarizing bandpass filters on 12 inch wafers[28]. (a) Photography of Si metasurface; (b) macroscopic diagram of metasurface; (c) top-view SEM image of a 3×3 Si array; (d) SEM image of Si structure located at wafer center; (e) cross-sectional TEM image of AA'
    Metasurface for holographic near-eye display[30]. (a) Unit cell of Huygens' metasurface; (b) image of metasurfaces; (c) virtual subject focused at the distance of 2 m; (d) real and virtual objects focused at distance of 2 m
    Printable Si nanocomposite metalens[10]. (a) Schematic of the metalens printing process; (b) SEM image of master mold; (c) SEM image of soft mold composed of patterned h-PDMS layer; (d) a buffer layer of PDMS; (e) image of the printed metalens on a lens tube, and the green circle is the metalens
    SEM image of silicon nitride waveguide cross section[42]
    Varifocal zoom metalens based on silicon nitride[36]. (a) Process flow for fabricating multiple large area metalenses in parallel using high-throughput stepper lithography-based processing; (b) photography of metalens; SEM images of fabricated nanoposts are shown at (c) normal inciedence and (d) 45° incidence
    TiO2 metasurfaces prepared by nanoimprinting and Sol-gel method[48]. (a) Photo and SEM image of Si master; (b) photo and SEM image of TiO2 soft mold; (c) SEM image of TiO2 replica and Fourier transform result of master; (d) AFM image of TiO2 and statistic results of pillar volume and height; (e) optical microscope image of TiO2 microcolumn and height profiles of three AFM images taken at the points of C, M, and S
    Fabrication of printable TiO2 metasurfaces[49]
    TiO2 metasurface with high aspect[49]. (a) SEM images of master and samples 1, 10, and 15; (b) SEM images of sample 15
    Nanoimprinted perovskite metasurfaces[52]. (a) SEM image of nanostripe; (b) SEM image of nanohole
    Perovskite metasurfaces manufactured by soft lithography[53]. (a) Preparation process; (b) mold filling process
    Precise three-dimensional generation of GQDs inside PDMS[57]. (a) Schematic of the dot array; (b) two-dimensional fluorescent images obtained at different z-axis focuses, the scale bars indicate 100 μm; (c) three-dimensional reconstruction fluorescent image; (d)(e) side and front views, the scale bars indicate 250 μm
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    Chi Zhang, Shumin Xiao. Progress in CMOS-Compatible Fabrication Process of Dielectric Metasurfaces[J]. Acta Optica Sinica, 2023, 43(8): 0822003

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Jan. 21, 2023

    Accepted: Mar. 21, 2023

    Published Online: Apr. 6, 2023

    The Author Email: Xiao Shumin (shumin.xiao@hit.edu.cn)

    DOI:10.3788/AOS230489

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