Acta Optica Sinica, Volume. 40, Issue 2, 0212004(2020)

Error Correction Algorithm for Optical Measurement System Based on Radial Basis Function Network

Ping Xue**, Hai He*, and Hongmin Wang
Author Affiliations
  • School of Automation, Harbin University of Science and Technology, Harbin, Heilongjiang 150080, China
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    Figures & Tables(11)
    Tracing analysis of stray light effect in photometric measurement system. (a) Optical ray in ideal photometric measurement system; (b) optical ray in general photometric measurement system
    Varying curves of PST values under different conditions. (a) PST value as a function of off-axis angle; (b) PST value as a function of irradiance
    Principle of three-dimensional ray tracing analysis for photometric measurement system
    RBF network model for error correction of photometric measurement
    Improved error correction model for RBF network
    Comparison of RBF training processes before and after improvement
    Aperture structure of inner wall of optical darkroom
    Simulation model of distributed photometric measurement platform. (a) Infinite space; (b) general photometric measurement system; (c) photometric measurement system with triple aperture denoising structure
    Comparison of theoretical and measured values of luminous intensity
    Analysis charts of correction results of RBF network. (a) Outputs of photometric data before and after correction; (b) distributions of errors before and after correction
    • Table 1. Basic information of light source measurement environment

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      Table 1. Basic information of light source measurement environment

      Model objectModel parameter
      Darkroom length /m10
      Darkroom width /m4
      Darkroom height /m3
      Darkroom materialAcrylic board
      Surface materialMatte black paint
      Absorption rate0.85
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    Ping Xue, Hai He, Hongmin Wang. Error Correction Algorithm for Optical Measurement System Based on Radial Basis Function Network[J]. Acta Optica Sinica, 2020, 40(2): 0212004

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    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: Jul. 23, 2019

    Accepted: Sep. 19, 2019

    Published Online: Jan. 2, 2020

    The Author Email: Xue Ping (1043854913@qq.com), He Hai (hai123193@163.com)

    DOI:10.3788/AOS202040.0212004

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